Numerical simulation on silane plasma chemistry in pulsed plasma process to prepare a-Si :H thin films

High Temperature and High Concentration SCR of NO with NH3 for the Oxyfuel Combustion Process: Fitting of Kinetics to Data from a Laboratory Reactor Experiment

“…Kim [27] studied the vanadia content and its effect on the formation of N 2 O over V 2 O 5 -WO 3 /TiO 2 catalysts with 1-8% vanadia. They observed increasing selectivity for the formation of N 2 O with an increased content of vanadia reaching 7.5% at 670 K for the 8% catalyst.…”

Effects of silyl concentration, hydrogen concentration, ion flux, and silyl surface diffusion length on microcrystalline silicon film growth

“…Self-consistent fluid models have been used to simulate silane plasma [12][13][14][15], and the model presented in this article is a self-consistent fluid model. Due to the discharge processes, silane is consumed and hydrogen is dissociated, the composition of the background gas is different form the feedstock gas and is chiefly made of neutrals, ions, and electrons.…”

Effect of duty cycle on residual stress and tribology behaviour of TiCx nanostructure coating deposited by PACVD method

“…4 Plasma CVD has the major advantage that coatings of uniform thickness and composition can be produced even on substrates with a complex shape at lower temperature. [3][4][5][6][7][8] Further study has indicated that the properties of titanium carbide are related to its chemical composition and texture and are a result of low adhesion or residual stresses in the thin film. [3][4][5][6][7][8][9][10] The residual stress in thin film deposited by PACVD may be either compressive or tensile, depending on the deposition conditions.…”