“…Over the past decades, process modeling has been developed using FEM, molecular dynamics model (MDM), and field model (FM) [18]. Moreover, FEM models have recently been widely developed [133,191], including those using the ANSYS (ANSYS Inc., Canonsburg, PA, USA) [110,196], ABAQUS (Simulia Corp., Providence, RI, USA) application software packages [81], and COMSOL Multiphysics (COMSOL Inc., Burlington, VT, USA) [197]. However, the MCE cannot investigate the formation and evolution of defect structures during a discharge at the atomic level [76].…”