Computational Science and High Performance Computing
DOI: 10.1007/3-540-32376-7_13
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Numerical simulation of plasma-chemical reactors

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Cited by 4 publications
(3 citation statements)
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“…In proportional chambers, the most intense formation of free radicals takes place around anode wires where the electric field reaches 20 -200 kV/cm. Dissociation of CF 4 molecules resulting from the impact of electrons of about 3 -5 eV occurs with formation of the following chemically active radicals [14,15] Thus, to recover MWPCs from ME caused by silicone or organic films on the cathode surface, the corresponding depositions can be etched in the presence of CF 4 . However, in the vicinity of the cathode, which is several millimeters away from the anode wires and the plasma environment, the concentration of fluorine radicals is small.…”
Section: A Curing Malter-like Effects In Mwpc In Presence Of Cfmentioning
confidence: 99%
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“…In proportional chambers, the most intense formation of free radicals takes place around anode wires where the electric field reaches 20 -200 kV/cm. Dissociation of CF 4 molecules resulting from the impact of electrons of about 3 -5 eV occurs with formation of the following chemically active radicals [14,15] Thus, to recover MWPCs from ME caused by silicone or organic films on the cathode surface, the corresponding depositions can be etched in the presence of CF 4 . However, in the vicinity of the cathode, which is several millimeters away from the anode wires and the plasma environment, the concentration of fluorine radicals is small.…”
Section: A Curing Malter-like Effects In Mwpc In Presence Of Cfmentioning
confidence: 99%
“…Various studies of dry etching processes showed that the etching rate in a CF 4 /O 2 mixture is significantly higher in comparison to the one in a pure CF 4 plasma [15,16]. Oxygen radicals promote the formation of •COF x , which quickly dissociates in collisions with surrounding electrons and atoms and indirectly increases the number of fluorine radicals in the gas discharge plasma, as shown by the following reactions: Moreover, oxygen itself plays a significant role in polymer film dry etching [17].…”
Section: B Gas Compositon For Accelerated Recovery From Malter Effectmentioning
confidence: 99%
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