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2013
DOI: 10.1016/j.egypro.2013.07.330
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Numerical Analysis of Electrical TCO / a-Si:H(p) Contact Properties for Silicon Heterojunction Solar Cells

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Cited by 83 publications
(38 citation statements)
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“…For such samples, a lowering of the measured V oc at high illumination intensities was sometimes observed. This evidence supports the belief that the WF of the n-type TCO, being lower than the one of a-Si:H(p), may result rather in a Schottky than an ohmic contact, causing a V oc drop and resistive losses under solar cell operation conditions [39], [42]. The value of n at 100 suns (n 100 ) was proposed as indicator for the strength of this effect [4].…”
Section: B Effects On Operating Voltage 1) High-low Suns-v Oc Curvessupporting
confidence: 61%
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“…For such samples, a lowering of the measured V oc at high illumination intensities was sometimes observed. This evidence supports the belief that the WF of the n-type TCO, being lower than the one of a-Si:H(p), may result rather in a Schottky than an ohmic contact, causing a V oc drop and resistive losses under solar cell operation conditions [39], [42]. The value of n at 100 suns (n 100 ) was proposed as indicator for the strength of this effect [4].…”
Section: B Effects On Operating Voltage 1) High-low Suns-v Oc Curvessupporting
confidence: 61%
“…9, the absence of variations in the high-illumination suns-V oc data is also remarkable. The perfect superposition of all the curves shown here, and the coincidence of their n 100 values indicates that-within the explored carrier density range-the ITO properties do not impact those of the presumed "Schottky contact" [39], [42].…”
Section: ) Impact Of Indium Tin Oxide Electrical Propertiesmentioning
confidence: 95%
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“…Their low net doping and high defect density make the optimization of the hole contact typically more challenging than that of the electron contact. As a minimum thickness (and doping) of the a-Si:H has to be a applied to form the junction [9,10] (ii), the parasitic photon absorption in the doped a-Si:H lowers the carrier generation in the absorber significantly [11]. (iii) The temperature stability of a-Si:H is limited to below 200°C [12], which calls for adapted process steps for back end processing (TCO, metallization) and module integration, both of which are hardly compatible with the well-established mainstream processes used for homojunction cells.…”
Section: Introductionmentioning
confidence: 99%
“…FF losses associated with heterocontact transport properties can be at least partially ascribed to the TCO/a-Si:H interface [10], [43]- [46]. Our experimental work with IBC-SHJ confirms the importance of this interface with respect to series-resistance losses; changes in the TCO layer composition have shown a relevant impact on total series resistance and FF of final devices (data not shown), as have changes in the deposition conditions of the doped a-Si:H layers.…”
Section: Series-resistance Components In Interdigitated Back-contamentioning
confidence: 99%