2010
DOI: 10.1364/oe.18.018945
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Numerical Analysis of Deep sub-wavelength integrated plasmonic devices based on Semiconductor-Insulator-Metal strip waveguides

Abstract: We report the first study of nanoscale integrated photonic devices constructed with semiconductor-insulator-metal strip (SIMS) waveguides for use at telecom wavelengths. These waveguides support hybrid plasmonic modes transmitting through a 5-nm thick insulating region with a normalized intensity of 200-300 μm(-2). Their fundamental mode, unique transmission and dispersion properties are consistent with photonic devices for guiding and routing of signals in communication applications. It has been demonstrated … Show more

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Cited by 84 publications
(39 citation statements)
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“…Among varieties of SPPWGs, the hybrid dielectric-loaded (DL) SPPWG combines the advantages of hybrid SPPWG [9][10][11] and DL SPPWG [12]: Long propagation length, relatively small mode area, and nanometer dimension of SPPWG [13][14][15]. The hybrid DL SPPWG using silicon (Si) dielectric (Si-based hybrid DL SPPWG, SiHDLW) [7,8,10,13,14,[16][17][18], which has been shown to yield strong field confinement [8,10,13,17,18], is a particularly attractive candidate for plasmonic devices because the waveguide is easier to fabricate with conventional nano/micro techniques [7]. In addition, SiHDLW optical devices adopting Silicon-on-Insulator (SOI) substrate, such as splitters [7], couplers [7,19], and modulators [20] have also been demonstrated.…”
Section: Introductionmentioning
confidence: 99%
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“…Among varieties of SPPWGs, the hybrid dielectric-loaded (DL) SPPWG combines the advantages of hybrid SPPWG [9][10][11] and DL SPPWG [12]: Long propagation length, relatively small mode area, and nanometer dimension of SPPWG [13][14][15]. The hybrid DL SPPWG using silicon (Si) dielectric (Si-based hybrid DL SPPWG, SiHDLW) [7,8,10,13,14,[16][17][18], which has been shown to yield strong field confinement [8,10,13,17,18], is a particularly attractive candidate for plasmonic devices because the waveguide is easier to fabricate with conventional nano/micro techniques [7]. In addition, SiHDLW optical devices adopting Silicon-on-Insulator (SOI) substrate, such as splitters [7], couplers [7,19], and modulators [20] have also been demonstrated.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, SiHDLW optical devices adopting Silicon-on-Insulator (SOI) substrate, such as splitters [7], couplers [7,19], and modulators [20] have also been demonstrated. Furthermore, the SiHDLW shows two common structures of top metal SiHDLW (TM-SiHDLW) [7,8,16,17,21] and bottom metal SiHDLW (BM-SiHDLW) [10,14,22]. The TM-SiHDLW shows a more promising potential than the BM-SiHDLW because of its flexibility to integrate with nanophotonic circuits [18].…”
Section: Introductionmentioning
confidence: 99%
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“…Currently, hybrid plasmonic waveguide proposals are emerging, using a low-index dielectric between a metal and a waveguiding higher index dielectric [6][7][8][9]. They often assume "square" geometries that are derived from simplified processing considerations, such as a preference for vertical etching and silicon-oriented applications.…”
Section: Introductionmentioning
confidence: 99%
“…A hybrid plasmon polariton (HPP) concept has been proposed to overcome this challenge 11,26,27 . This approach uses a high dielectric constant semiconductor strip separated from a metal surface by a nanoscale low dielectric constant gap.…”
mentioning
confidence: 99%