Novel Resist Materials Using Acid Amplifiers. Part II.

Stable, fluorinated acid amplifiers for use in EUV lithography

“…The undesirable decomposition pathway is uncatalyzed thermal decomposition which results in the formation of an olefin byproduct and an acid. Several acid amplifiers (20)(21)(22)(23)(24)(25)(26)(27)(28)(29)(30) were reported in the literature [6][7][8][9][10][11][12][13] prior to the beginning or our research in 2005. For the most part, these AAs generate weak sulfonic acids such as toluene sulfonic acid.…”

4-(tert-Butoxycarbonyloxy)benzylp-toluenesulfonates as acid amplifiers applicable to chemically amplified photoresists

“…3). It follows that the sensitivity enhancement arises from the involvement of the acid proliferation of 2 which is triggered by a photogenerated acidic species, just as in the cases of the other acid amplifiers [17][18][19][20][21][22][23] . The level of the photosensitivity enhancement induced by 2 is not far from the other acid amplifiers developed in this laboratory.…”

“…We have so far developed four kinds of acid amplifiers releasing sulfonic acids; tert-butyl acetoacetate derivatives 16,17) , ketal sulfonates 18) , diol monosulfonates 19) and a trioxane 20) . They all exhibit autocatalytic acidolysis reactions in solution and in polymer films so that photosensitivity enhancement is achieved by their addition to conventional chemically amplified photoresists [21][22][23] .…”

Fluorine-Stabilized Acid Amplifiers for Use in EUV Lithography

“…The undesirable decomposition pathway is uncatalyzed thermal decomposition which results in the formation of an olefin byproduct and an acid. Several acid amplifiers (20-30) were reported in the literature [6][7][8][9][10][11][12][13] prior to the beginning or our research in 2005.…”