2014
DOI: 10.1109/led.2013.2294375
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Novel Defects-Trapping ${\rm TaO}_{\rm X}/{\rm HfO}_{\rm X}$ RRAM With Reliable Self-Compliance, High Nonlinearity, and Ultra-Low Current

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Cited by 53 publications
(26 citation statements)
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“…The experimental results (reduced I Reset , oxide dependent LRS, similar variability for LRS and HRS) may be explained by bulk switching and conduction mechanisms rather than filamentary ones (Chen et al, 2014; Goux et al, 2014) when very low I CC (<20 μA) are used. We believe that in this case the current conduction in the LRS is dominated by trap-assisted tunneling as is the case for the HRS (Wong et al, 2012).…”
Section: Oxram Electrical Device Analysismentioning
confidence: 91%
“…The experimental results (reduced I Reset , oxide dependent LRS, similar variability for LRS and HRS) may be explained by bulk switching and conduction mechanisms rather than filamentary ones (Chen et al, 2014; Goux et al, 2014) when very low I CC (<20 μA) are used. We believe that in this case the current conduction in the LRS is dominated by trap-assisted tunneling as is the case for the HRS (Wong et al, 2012).…”
Section: Oxram Electrical Device Analysismentioning
confidence: 91%
“…The nitrogen‐rich SiN x layer at the Ta/SiN x interface as shown in Figure c is a series resistor that prevents the formation of a continuous filament. This interface resistor and the dendric Si‐DB conductive channel cause the self‐compliance behavior in all the samples …”
Section: Resultsmentioning
confidence: 99%
“…The LRS resistances of devices increased gradually with the increasing duration of plasma oxidation (Table 1). In other words, the devices were loaded with a layer of Ta 2 O 5 with higher resistance after plasma oxidation [27]. These factors resulted in a gradual reduction of I reset and finally I reset decreased to approximately 40 A.…”
Section: The Drastic Reduction Of Reset Current and Improvement Of Dementioning
confidence: 99%