Novel Cylindrical Magnetic Levitation Stage for Rotation as well as Translation along Axles with High Precisions

Jeongwoo, Jeon; Caraiani, M.; Lee, Chang-Lin; Jeong, Yong Hwan; Kim, Jong‐Moon; Oh, Hyeon-Seok; Kim, Sungshin

doi:10.5370/kiee.2012.61.12.1828

Cited by 2 publications

(1 citation statement)

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“…The core to actuate such a drive comprises a rotary E-beam controller and an ultra-precision stage. Instead of the conventional flat magnetic coils (figure 3), a cylindrical, rotating magnetic levitation coil module (figure 4) is employed with an ultra-precision linear stage [53][54][55]. The use of a rotary transfer type coil module can further alleviate the heat generation problem in the magnetic levitation coil by minimizing the thermal deformation of the master caused by operation in the long-term vacuum state due to the exposure speed of the E-beam.…”

Section: Introductionmentioning

confidence: 99%

Nanopatterning on the cylindrical surface using an E-beam pre-mapping algorithm

Lee

Jeong

2018

J. Micromech. Microeng.

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Lithography technology has advanced from flat plates to cylindrical surfaces, aiming to address the emerging needs in flexible and mass-customized applications. Nanoscale ultraprecise patterns have benefited from advanced lithography techniques also involving precision stage technology and material development. While conventional lithography mostly relies on flat wafer-base processing, fabricating nanopatterns on cylindrical surfaces can further expand the applicability and productivity of nanoscale lithography, for example, by integrating with the continuous and scalable plate-to-roll or roll-to-roll nanopatterning techniques. In this regard, we develop a novel nanopatterning methodology that can directly create a nanoscale pattern on the surface of a cylindrical mould by utilizing the E-beam pre-mapping algorithm for uniform E-beam exposure. Here, E-beam pre-mapping was employed to ensure uniform exposure over the cylindrical surface from the planar E-beam source, where the trajectory of the E-beam is modulated along the curved surface of the cylinder based on the pre-calibration of the surface profile. We design and build up a cylindrical exposure system with an E-beam gun that can move at a high degree of freedom. We also perform in-depth analytic modelling and profiling of the target curved surface, which is an essential step for applying E-beam pre-mapping for uniform exposure. By conducting the developed process, we finally achieve a very fine 60 nm scale half-pitch pattern on the cylindrical surface, which may be further extended to enable direct nanopatterning on curved surfaces for many unique applications.

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Section: Introductionmentioning

confidence: 99%