Novel catalysts: Indium implanted SiO2 thin films

Kiuchi

e-J. Surf. Sci. Nanotechnol.

et al. 2014

In an earlier paper [S. Yoshimura et al., Appl. Surf. Sci. 257, 192 (2010)], it has been demonstrated that indium (In) implanted silicon dioxide (SiO2) thin films catalyze a reaction of benzhydrol with acetylacetone. In this study, it is found that the threshold In ion incident energy for manifestation of the catalytic effect exists between 400 and 470 eV. Furthermore, a technique to implant gallium (Ga) to SiO2 films has been developed with highly controlled doses and injection energies for the formation of thin films that promote Ga catalysts. The efficiency of catalytic reactions by Ga implanted SiO2 thin films is yet to be improved. Unlike In implanted SiO2, the reason why no significant reaction was observed in the case of Ga implanted SiO2 films examined in this study seems that the Ga ion energy was so low that deposited surface Ga atoms should lack interactions with Si atoms for the manifestation of catalytic reaction.

Section: Introductionmentioning

confidence: 99%

Low Energy Indium or Gallium Ion Implantations to SiO<sub>2 </sub>Thin Films for Development of Novel Catalysts

Kiuchi

e-J. Surf. Sci. Nanotechnol.

et al. 2014

“…Therefore it is conceivable that surfaces of the substrates with 50 or 100 eV injections consist of In films and the surface In atoms lack interactions with Si atoms which are necessary for the catalytic effect. Since metallic In alone does not catalyze the organic chemical reaction [3], these substrates do not catalyze the reactions. For the substrates with 200, 400, and 470 eV injections, on the other hand, In ions are likely to be implanted into the subsurface regions of SiO 2 films as the ion energy is high enough that no In deposition takes place.…”

Section: Evaluation Of Catalytic Reactions By Bi Injected Sio2mentioning

confidence: 99%

“…Catalytic ability of the Bi injected SiO 2 thin films was examined for a reaction of benzhydrol with acetylacetone, which has been found to be promoted by catalytic effects of In injected SiO 2 thin films [3]. The organic chemical reactions were examined in a 10 mL flame-dried two necked round-bottomed flask equipped with a stop cock, a Teflon-coated magnetic stirring bar, and a reflux condenser fitted with nitrogen inlet adapter.…”

Section: Evaluation Of Catalytic Reactions By Bi Injected Sio2mentioning

confidence: 99%

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Low Energy Metal Ion Beam Production with a Modified Freeman-Type Ion Source for Development of Novel Catalysts

Kiuchi

e-J. Surf. Sci. Nanotechnol.

et al. 2012

Self Cite

Interactions of indium (In) and silicon (Si) atoms have been found to catalyze certain organic chemical reactions with high efficiency. In a recent paper [S. Yoshimura, et al., Appl. Surf. Sci., 257, 192 (2010)], it has been demonstrated that an In injected SiO2 thin film formed under specific ion beam conditions catalyzes a reaction of benzhydrol with acetylacetone. In this study a technique to implant bismuth (Bi) ions into SiO2 thin films has been developed with highly controlled ion doses and injection energies for the formation of thin films that promote Bi(III) catalysis in organic chemistry. For this purpose, the Freeman-type ion source of our beam system was modified with a new sputtering target. In addition, sticking probabilities of Bi have been obtained with the use of a quartz crystal microbalance. Although efficiency of catalytic reactions by a Bi implanted SiO2 thin film is yet to be improved, the technique provides a Bi-Si based novel catalyst of a thin film type.

“…Previously, we successfully synthesized a catalyst by exposing silicon dioxide films to an indium ion beam, using a low energy ion beam system [7][8][9]. Subsequently, we attempted to implant indium atoms in powdered materials using the same ion beam system, using pellets produced by compression molding.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Indium Nanoparticles on Powdered Material by Pulse Arc Plasma to Synthesize Catalysts for Friedel-Crafts Alkylation

e-J. Surf. Sci. Nanotech.

Sugimoto

et al. 2018

Indium nanoparticles were deposited on zeolite powders using a pulse arc plasma system. The resulting materials were capable of catalyzing an organic chemical reaction, namely the Friedel-Crafts alkylation between benzhydryl chloride and anisole. Varying the electrical capacitance in the plasma system (360 µF or 1080 µF) resulted in some changes in the indium concentration on the sample surface and in the size of the indium nanoparticles, but the catalytic ability of the material was largely unaffected.