“…ALD is a vapor-phase deposition technique that occurs through sequential self-limiting surface reactions and was first developed in the 1970s by Suntola and Antson for ZnS growth . During the following years, the use of ALD expanded tremendously to growth a variety of materials that include metals, metal oxides, alloys, and nanolaminates making this technique appealing for many areas of applications such as energy technologies, like photovoltaic, catalysis and batteries or micro- and nanoelectronics. − …”