Normal incidence reflectance of ion beam deposited SiC films in the EUV

Keski-Kuha, Ritva; Osantowski, John F.; Herzig, H.; Gum, Jeffrey S.; Toft, Albert R.

doi:10.1364/ao.27.002815

Cited by 42 publications

(11 citation statements)

References 5 publications

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“…In many practical applications, the mirror substrate must be kept close to room temperature during coating deposition. With this limitation, sputter-deposited coatings of SiC [6,7], along with B 4 C [8], provide a reflectance of ~30-35% in the 60-100-nm range after the material has been exposed to the atmosphere for extensive periods. Below 65 nm, single layers of a few metals like Pt [9,10], Ir [11], and Os [12], have a relatively high reflectance of up to ~20-35% in the ~45-70 nm range.…”

Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp 3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. 5962-5963 (1994). 9. G. F. Jacobus, R. P. Madden, and L. R. Canfield, "Reflecting films of platinum for the vacuum ultraviolet," J.Opt. Soc. Am. 53(9), 1084-1088 (1963). 10. W. R. Hunter, D. W. Angel, and G. Hass, "Optical properties of evaporated platinum films in the vacuum ultraviolet from 220 Å to 150 Å," J. Opt. Soc. Am. 69(12), 1695-1699 (1979). 11. G. Hass, G. F. Jacobus, and W. R. Hunter, "Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å," J. Opt. Soc. Am. 57(6), 758-762 (1967). 12. J. T. Cox, G. Hass, J. B. Ramsey, and W. R. Hunter, "Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 Å," J. Opt. Soc. Am. 63(4), 435-438 (1973 Robertson, "Density, sp 3 fraction, and cross-sectional structure of amorphous carbon films determined by x-ray reflectivity and electron energy-loss spectroscopy," Phys. Rev. B 62(16), 11089-11103 (2000). 32. F. Xiong, Y. Y. Wang, and R. P. H. Chang, "Complex dielectric function of amorphous diamond films deposited by pulsed-excimer-laser ablation of graphite," Phys. Rev. B Condens. Matter 48(11), 8016-8023 (1993). 33. S. Waidmann, M. Knupfer, J. Fink, B. Kleinsorge, and J. Robertson, "Electronic structure studies of undoped and nitrogen-doped tetrahedral amorphous carbon using high-resolution electron energy-loss spectroscopy," J.

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Section: Introductionmentioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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“…BC 4 is superior to sputtered silicon carbide 12 (SiC) not only in reflectivity at wavelengths below 90 nm, but also in stability. The reflectivity of SiC degrades when exposed to atomic oxygen and thus an instrument's sensitivity will degrade over time in a space environment, 13,14 while the reflectivity of BC 4 is stable.…”

Section: Effective Areamentioning

confidence: 99%

A compact high-throughput imaging EUV/FUV spectrometer

et al. 2003

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We present the optical design and predicted performance of the Extreme Ultraviolet Spectrometer (EUVS) developed for the Jupiter Magnetospheric Explorer (JMEX) mission. JMEX was proposed as small explorer (SMEX) mission designed to observe the Jovian system to study the dynamical relationship between Jupiter's magnetosphere and Io, the primary source of material for the Io plasma torus. NASA selected JMEX as one of six SMEX missions for detailed technical study. While JMEX was ultimately not selected for flight, the EUVS instrument design has a unique set of performance characteristics that may be useful for other applications, such as a multi-object spectrometer, a push-broom spectrometer for diffuse objects, or an imaging spectrometer with high spatial resolution.The EUVS is an imaging spectrograph originally designed to observe the Io plasma torus. EUVS provides moderate resolution (~0.1 nm) spectra between 64 to 114 nm over +/-260" with 2" spatial resolution. The optical design is based on an off-axis Gregorian telescope, where the secondary mirror is replaced with an aberration-corrected holographic grating. The grating diffracts and focuses the UV light onto a cross-delay line microchannel plate detector with a potassium bromide photocathode. The primary mirror and grating are coated with boron carbide to maximize the normal incidence reflectivity at the shortest wavelengths. This high throughput, two-element design provides a compact instrument suitable for a small spacecraft while maintaining an efficient optical path that provides 7-12 cm 2 of effective area.

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“…Some researchers have developed special investigation to find degradation speed of reflectance of fresh aluminum layer after exposure to controlled doses of atomic and molecular oxygen [10,11]. Optical constants of the commonly-used materials have been intensively investigated [12][13][14][15], meanwhile reflectance determinations in the FUV spectral region have been proposed with different methods [16][17][18][19]. In this paper, the principle to develop broadband reflective FUV coatings is based on aluminum coating with bilayer.…”

Section: Introductionmentioning

confidence: 99%