2003
DOI: 10.1063/1.1591077
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Nonlinear absorption temporal dynamics of Fe-doped GaInAs/InP multiple quantum wells

Abstract: Articles you may be interested in290 fs switching time of Fe-doped quantum well saturable absorbers in a microcavity in 1.55 μ m range Appl. Phys. Lett. 85, 5926 (2004); 10.1063/1.1804239 Ultrashort, nonlinear, optical time response of Fe-doped InGaAs/InP multiple quantum wells in 1.55-μm range Appl. Phys. Lett. 82, 1670 (2003); 10.1063/1.1557333 High-speed 1.55 μm Fe-doped multiple-quantum-well saturable absorber on InP Appl. Phys. Lett. 78, 4065 (2001); 10.1063/1.1381410 Time-frequency spectroscopy of an InG… Show more

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Cited by 18 publications
(7 citation statements)
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“…The decrease in decay time is attributed to the relaxation mechanism between neutral Fe state in its Fe 3+ configuration in wells with photogenerated electrons and holes. 12,13 SWNT used in this work were grown using a modified gas phase process ͑HiPCO͒, and were supplied by Carbon Nanotechnologies Inc. The raw material was initially dispersed and sonicated in N-methyl pyrrolidone.…”
mentioning
confidence: 99%
“…The decrease in decay time is attributed to the relaxation mechanism between neutral Fe state in its Fe 3+ configuration in wells with photogenerated electrons and holes. 12,13 SWNT used in this work were grown using a modified gas phase process ͑HiPCO͒, and were supplied by Carbon Nanotechnologies Inc. The raw material was initially dispersed and sonicated in N-methyl pyrrolidone.…”
mentioning
confidence: 99%
“…MQW-SAs typically have a rather long recovery time (in the nanosecond range). In order to significantly decrease the response time of these materials and to make them compatible with high bit rate operation, capture and recombination centers must be introduced during or after crystal growth by means of low-temperature molecular beam epitaxy [15], ion implantation [16], heavy ion irradiation [17], or Be or Fe doping [18], [19]. These methods of damage creation have been reported to provide recovery times in the sub-picosecond range [20], [21].…”
mentioning
confidence: 99%
“…To significantly decrease the response time of these materials, capture and recombination centers can be introduced during or after crystal growth by means of low-temperature molecular beam epitaxy, 4 highenergy ion implantation, 5 or Be or Fe doping. 6,7 These methods of damage creation have been reported to provide recovery times as short as a few pi-coseconds in an InP-based semiconductor. 5 The combination of heavy-ion irradiation with a silver-based backmirror compact microcavity has proved to be a convenient solution to making efficient optical gates.…”
mentioning
confidence: 99%