Non lithographic block copolymer directed self-assembled and plasma treated self-cleaning transparent coating for photovoltaic modules and other solar energy devices

Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment

“…Among the different systems, TiO2, as high-k, stable and low cost semiconductor has been identified as an ideal candidate for its optical [7], dielectric [8][9] and photocatalytic [10] properties. Trying to expand these properties, TiO2 NPs were extensively prepared and studied especially for cosmetic [11], antibacterial [12], solar cell [13][14][15][16], self-cleaning [17], hydrophobic [18] and isolative [19] applications.…”

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

“…Applications include, but are not restricted to, hard-disk drive and magnetic storage devices [ 126 , 132 , 133 , 134 , 135 ], nanophotonics and plasmonics materials [ 136 , 137 , 138 ], or chemical sensors [ 139 ]. Most often, BCPs are still used as templates for patterning, as in the case of graphene structuring [ 140 , 141 , 142 , 143 ], the fabrication of nanoporous membranes [ 144 , 145 , 146 , 147 , 148 ] or energy storage, photovoltaics and batteries [ 149 , 150 , 151 , 152 ]. In other applications, however, BCPs can present a more active role and can be used as stabilizing agent, for surface functionalization [ 153 , 154 , 155 , 156 ] or to aid in nanoparticle self-assembly [ 157 ].…”

Non-equilibrium thermal annealing of a polymer blend in bilayer settings for complex micro/nano-patterning

“…On-demand alteration of the surface properties of a given surface using small scale structured polymeric domains nds a broad spectrum of interdisciplinary applications such as fabrications of robust membrane materials, [1][2][3][4][5] highly ordered magnetic bit pattern media, 6,7 bio-inspired superhydrophobic and self-cleaning surfaces, [8][9][10][11][12][13] anti-reection coatings, 14,15 negative refractive index materials, 16 etc. Fabrication of micro/nano scale morphology involves different techniques such as photolithography, 17 e-beam lithography, 18,19 reactive ion etching (RIE), 20 vapor deposition methods, 21 nanoimprint lithography (NIL), [22][23][24] micro-contact printing (mCP), [25][26][27][28] elastic contact lithography (ECL), 29 electric eld induced pattern generation, [30][31][32][33][34][35]68 thermal or solvent vapour assisted dewetting of polymer lms, [36][37][38][39]69 phase separation mediated pattern generation, [40][41]…”