2021
DOI: 10.1039/d1ra00017a
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Non-equilibrium thermal annealing of a polymer blend in bilayer settings for complex micro/nano-patterning

Abstract: Fast morphological evolution of polymer blend dictated by underlying polymer thin film upon rapid thermal annealing at high temperature.

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Cited by 3 publications
(7 citation statements)
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References 67 publications
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“…PMMA has the most prominent Raman peak at 2957 cm À1 which is featured by the vibration of C-H stretching. 3 This is observed only for all the as-deposited samples (Figure 3a,d,g) and the samples after washing with cyclohexane (Figure 3b,e,h). On the other hand, PS demonstrates three of its characteristic peaks between 3200 and 2800 cm À1 .…”
Section: Resultsmentioning
confidence: 89%
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“…PMMA has the most prominent Raman peak at 2957 cm À1 which is featured by the vibration of C-H stretching. 3 This is observed only for all the as-deposited samples (Figure 3a,d,g) and the samples after washing with cyclohexane (Figure 3b,e,h). On the other hand, PS demonstrates three of its characteristic peaks between 3200 and 2800 cm À1 .…”
Section: Resultsmentioning
confidence: 89%
“…The precise location of the component polymers and the composition of the threads or connected droplets was further confirmed at each stage by Raman spectroscopy (Figure 3). PMMA has the most prominent Raman peak at 2957 cm −1 which is featured by the vibration of C–H stretching 3 . This is observed only for all the as‐deposited samples (Figure 3a,d,g) and the samples after washing with cyclohexane (Figure 3b,e,h).…”
Section: Resultsmentioning
confidence: 92%
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