Dynamic contact line lithography: Template-less complex Meso-patterning with polystyrene and poly(methyl methacrylate)

Murmu, Kaniska; Burgula, Krishna Pradeep; Pattader, Partho Sarathi Gooh

doi:10.1016/j.jcis.2021.05.100

Cited by 3 publications

(11 citation statements)

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“…Changing the speed to 40 μm/s slightly change the morphology of the Janus structure with reduced undulation (see Figure S1 in supporting information, section S1) as indicated by the phase diagram reported in our earlier report. 36 The average width of the threads is 25 AE 3 μm, and the periodicity of the deposition is of 51 AE 2 μm. The morphology of the Janus threads is significantly influenced by the composition ratio.…”

Section: Resultsmentioning

confidence: 99%

“…engender micro/nanostructures in soft films. Selfassembly of these random mesoscale features to the wellordered patterns guided by a physicochemical template, 35 or even without a template, 36 is also reported. The phase separation in polymer blends or copolymers provides tools for further miniaturization of the developed structure.…”

Section: Introductionmentioning

confidence: 86%

“…The guidelines for the choice of the parameters are discussed in detail in our earlier report. 36 The composition of PS and PMMA was varied in the blend by mixing PS and PMMA solution in 1:3, 1:1, and 3:1 weight ratios. Both the polymers, PS (M w $ 192,000, purity: 99%, CAS No.…”

Section: Solution Preparationmentioning

confidence: 99%

“…The details of the DCLL have been discussed elsewhere. 36 Briefly, the silicon substrate was placed horizontally, on a custom-made unidirectional movable stage (motorized stage from Holmarc, India) (Figure 1). A stainless-steel blade (Gillette, India) was kept perpendicular to the silicon substrate by maintaining a narrow gap distance of $ 200 μm.…”

Section: Dynamic Contact Line Lithographymentioning

confidence: 99%

“…53 In our earlier report, we demonstrated templateless mesoscale threads or droplets of homopolymer using dynamic contact line lithography (DCLL). 36 In that article, a morphological phase diagram to predict the deposited morphology on a Si/glass substrate was reported. Sequential DCLL with different polymers in appropriate solvent resulted in a decorated surface with multiple polymeric threads.…”

Section: Introductionmentioning

confidence: 99%

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Janus micro‐thread to micro‐nanodroplets using dynamic contact line lithography

Murmu

Pandey

Roy

et al. 2022

J of Applied Polymer Sci

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Dynamic contact line lithography (DCLL) is generally used for the templateless but well-ordered deposition of polymer micro/nanostructures from the solution of homopolymer. DCLL from the blend of several polymers in a common suitable solvent can generate rich morphologies including nanostructured Janus micro threads on a surface which might be challenging to fabricate using any other method. A blend of polystyrene (PS) and poly(methyl methacrylate) (PMMA) in toluene with different compositions and concentrations are used for DCLL at a constant contact line speed of 10 μm/s. Variations of compositions and the overall concentration of polymer, engender Janus micro threads to undulated threads and multi-layered micro/nanodroplets of PS/PMMA. Interestingly, the more soluble PS phase separates first compared to less soluble PMMA near the contact line due to the enhanced local concentration of PS during the convective flow of the solvent toward the contact line. This is also verified by DCLL using PS/PMMA blend in ethyl acetate as well. In that case, more soluble PMMA deposits first near the contact line compared to marginally less soluble PS in the solvent.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 86%

Section: Solution Preparationmentioning

confidence: 99%

Section: Dynamic Contact Line Lithographymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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