2014
DOI: 10.1063/1.4865457
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Non-equilibrium deposition of phase pure Cu2O thin films at reduced growth temperature

Abstract: Cuprous oxide (Cu2O) is actively studied as a prototypical material for energy conversion and electronic applications. Here we reduce the growth temperature of phase pure Cu2O thin films to 300 °C by intentionally controlling solely the kinetic parameter (total chamber pressure, Ptot) at fixed thermodynamic condition (0.25 mTorr pO2). A strong non-monotonic effect of Ptot on Cu-O phase formation is found using high-throughput combinatorial-pulsed laser deposition. This discovery creates new opportunities for t… Show more

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Cited by 56 publications
(48 citation statements)
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“…At higher oxygen pressure, the Cu-O phase diagram reflects formation of both Cu 2 O and CuO phases during oxidation [25]. In our investigation, no crystalline phase of copper oxide was formed at 80 mTorr while Cu 2 O was formed as the major component in the thin film fabricated at 100 mTorr partial pressure of oxygen, and the results are consistent with recent studies [26].…”
Section: Structural Study Of Pristine and Ion Implanted Thin Filmssupporting
confidence: 92%
“…At higher oxygen pressure, the Cu-O phase diagram reflects formation of both Cu 2 O and CuO phases during oxidation [25]. In our investigation, no crystalline phase of copper oxide was formed at 80 mTorr while Cu 2 O was formed as the major component in the thin film fabricated at 100 mTorr partial pressure of oxygen, and the results are consistent with recent studies [26].…”
Section: Structural Study Of Pristine and Ion Implanted Thin Filmssupporting
confidence: 92%
“…A growth temperature gradient was induced perpendicular to the cation composition gradient by contacting the substrate on one end with a heated metal pad. 21 Hot-side set point temperatures were 110 • C, 220 • C, 330 • C, and 400 • C, which provided an overall spread in growth temperature from 340 • C to 60 • C. Actual growth temperatures achieved were calibrated by placing a thermocouple in contact with the substrate surface at four representative regions (along the decreasing temperature gradient and spaced 12.5 mm apart) for each of the hot-side temperatures mentioned. Additionally, a sample was grown with no active heating of the substrate, and was calibrated by thermocouple to be at 35 • C as a result of sputtered particle impingement on the substrate surface during growth.…”
Section: Methodsmentioning
confidence: 99%
“…The combinatorial synthesis and characterization approach [20,21] was used to deposit Mn 1−x Zn x O thinfilm "libraries" with both a composition [22] and a temperature [23] gradient. The samples of the present work were grown by PLD from MnO and ZnO targets in the temperature range 180°C ≤ T ≤ 520°C, spanning a wide composition range of about 0.05 ≤ x ≤ 0.75, which extends to both sides of the predicted critical composition for the structural transition.…”
Section: Rsmentioning
confidence: 99%
“…We employed a thin-film highthroughput combinatorial approach [20,21] to deposit "libraries" with a spatial gradient in both the composition [22] and the substrate temperature [23], using commercial 2-inch targets (purity 99.99%) of MnO, ZnO, and 4% Ga-doped ZnO. A calibration process was performed to express the substrate temperature as a function of the position on the substrate and the set-point temperature [23]. The laser was operated at 40 Hz, and the beam was focused through a 60-cm lens onto the rotating targets at a 45°a ngle, with a laser fluence of 4 J=cm 2 on the target surface.…”
Section: Combinatorial Synthesismentioning
confidence: 99%