Non-Destructive Optical Techniques for Characterizing Semiconductor Materials and Devices

Abstract

In the information age, communications technology depends on the efficient manufacture ofphotonic and electronic devices. Optical testing promotes manufacturing efficiency by controlling the quality ofincoming materials, providing rapid feedback for process improvements, and analyzing why a product has failed. New, non-destructive optical techniques are being used to measure keyproperties ofsemiconductor materials and devices. Optical mapping reveals defective regions invarious types ofwafers, as well as in semiconductor-based lasersand detectors used inAT&T's lightwave communication systems. New optical testing techniques include optical beam-induced reflectance (OEIR) , whose signals are used to map silicon, and spatially resolved photoluminescence (SRPL) , which performs highresolution mapping ofIII-V semiconductor materials.