Non-constant diffusion characteristics of nanoscopic Mo–Si interlayer growth

Bosgra, J.; Verhoeven, J.; Kruijs, R. W. E. van de; Yakshin, Andrey; Bijkerk, F.

doi:10.1016/j.tsf.2012.08.051

Cited by 5 publications

(4 citation statements)

References 11 publications

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“…The diffusion-reaction mechanism in Mo/Si multilayers was recently studied by Bosgra et al [29] and it was shown that the diffusion rate decreased as the silicide interlayers grew [29]. Therefore, the simple parabolic growth law of interlayers (equation 1.14) is not valid for all nanoscale multilayered structures and should be applied with caution.…”

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confidence: 99%

Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers

Nyabero¹

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This work is part of the research programme 'Controlling photon and plasma induced processes at EUV optical surfaces (CP3E)' of the 'Stichting voor Fundamenteel Onderzoek der Materie (FOM)', which is financially supported by the 'Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)'. The CP3E programme is co-financed by Carl Zeiss SMT and ASML. We also acknowledge financial support from Agentschap NL (EXEPT project).

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confidence: 99%

Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers

Nyabero¹

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“…When it comes to thermally-activated interdiffusion phenomena, the common approach is to define interdiffusion between layers in terms of the activation energy for diffusion. 54 However, in the case ultra-thin film layers, a wide range of activation energy values can be found in the literature for a given thin-film system because of its dependence on layer thicknesses, structural properties, and deposition conditions. [54][55][56] Therefore, it is essential to understand the role of layer structural properties (grain boundaries, density, roughness) and layer material properties (atomic size, mixing energy) in thermally-activated interdiffusion phenomenon.…”

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confidence: 99%

“…54 However, in the case ultra-thin film layers, a wide range of activation energy values can be found in the literature for a given thin-film system because of its dependence on layer thicknesses, structural properties, and deposition conditions. [54][55][56] Therefore, it is essential to understand the role of layer structural properties (grain boundaries, density, roughness) and layer material properties (atomic size, mixing energy) in thermally-activated interdiffusion phenomenon. A generic model based on layer properties that can, at least, qualitatively predict the interdiffusion phenomena will be useful in improving the thermal stability of the thin-film stack.…”

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confidence: 99%

Surface and interface diffusion processes in nanoscale thin films

Chandrasekaran

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“…Internal ML structure changes can be caused by intermixing due to thermal annealing or diffusion of elements such as oxygen into the ML structure. This can result in a change in the bi-layer period or reduce the optical contrast between the absorber and spacer layer in the ML stack [102][103][104][105][106]. As a consequence of these structural ML changes, the optical performance of LMGs in terms of bandwidth, peak reflectivity and/or peak position, can be affected.…”

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confidence: 99%

Single-order lamellar multilayer gratings

Meer¹

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Cover: 3D artist impression of a Lamellar Multilayer Grating (LMG). A Transmission Electron Microscope image of an actual LMG is shown on the rear. The grating was etched into a 400 bi-layer W/Si multilayer mirror with a total stack height H of 1 μm and a tungsten layer thickness of only 3 atoms. The grating had a period D of 300 nm and a lamel width ΓD of 75 nm. In comparison to the TEM image on the rear, the red and green layers in the artist impression correspond to tungsten and silicon, respectively. The bi-layer period in the artist impression is overestimated by a factor of 10 for visibility. SummaryA major challenge in the soft x-ray (SXR) and eXtreme UltraViolet (XUV) spectral ranges is the ability to manipulate the incident radiation using optical elements. By patterning conventional multilayer mirrors with nanoscale structures, novel optical elements with a variety of optical properties can be obtained. In this work, the design, fabrication and characterization of Lamellar Multilayer Gratings (LMG) was investigated. Such LMGs are a particular form of the general class of Bragg-Fresnel optics which combine Fresnel optics with Bragg reflection to provide unique dispersive and focusing optics. In particular, LMGs can be used to improve the spectral resolution of x-ray fluorescence techniques.A Coupled Waves Approach (CWA) was derived to simulate the optical performance, in terms of resolution and reflectivity, of LMGs. This CWA allowed to study the physical principles behind LMGs and resulted in the identification of an optimal LMG operating regime. In this regime, the incident beam is reflected in a single diffraction order and is hence referred to as the singleorder regime. Such single-order LMGs were fabricated using UV-NanoImprint Lithography and Bosch Deep Reactive Ion Etching, a process chosen to enable rapid practical development. Single-order operation was experimentally demonstrated and showed an improvement in spectral resolution of a factor of 3.8 with regard to conventional multilayer mirrors. Singe-order excitation of higher diffraction orders was also measured and analyzed.Single-order operation often requires multilayer stacks and grating structures that cannot be fabricated with sufficient accuracy using current technologies. As this invalidates the semi-infinite multilayer approximation, we investigated the optical performance of LMGs with finite multilayer stacks. We determined the ratio between the absorber thickness and bi-layer period of the multilayer stack can be used to further tailor LMG optical performance to maximize bandwidth reduction or minimize peak reflectivity loss. We also investigated various degradation processes that could limit the lifetime of LMGs, which is important for the applicability of such elements. Oxidation of tungsten and silicon as well as changes to the sidewall composition were clearly seen. However, SXR reflectivity remained stable to within measurement accuracy for an extended storage period of 18 months in a 1 atm air environment. The possibility of ...

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Non-constant diffusion characteristics of nanoscopic Mo–Si interlayer growth

Cited by 5 publications

References 11 publications

Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers

Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers

Surface and interface diffusion processes in nanoscale thin films

Single-order lamellar multilayer gratings

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