1982 International Electron Devices Meeting 1982
DOI: 10.1109/iedm.1982.190285
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No image lag photodiode structure in the interline CCD image sensor

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Cited by 135 publications
(67 citation statements)
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“…This buried structure consisted in adding a heavily doped p+ thin layer on the top of the n layer of the pn junction making it a vertical p+np structure. This device had also another virtue consisting in an extremely lower dark current compared to pn junctions [20]. The name of PPD has first been given to this structure in a 1984 publication [21] presenting an enhancement of the buried photo diode quantum efficiency through the reduction of the p+ layer thickness.…”
Section: Brief Historical Reviewmentioning
confidence: 99%
See 1 more Smart Citation
“…This buried structure consisted in adding a heavily doped p+ thin layer on the top of the n layer of the pn junction making it a vertical p+np structure. This device had also another virtue consisting in an extremely lower dark current compared to pn junctions [20]. The name of PPD has first been given to this structure in a 1984 publication [21] presenting an enhancement of the buried photo diode quantum efficiency through the reduction of the p+ layer thickness.…”
Section: Brief Historical Reviewmentioning
confidence: 99%
“…But the pn junction photodiodes performance was mainly limited by the sampled noise after reset, commonly referred to as the kT C noise and the incomplete charge transfer during the readout [19]. To address these issues, N. Teranishi invented the buried pn junction that was first presented in 1982 [20]. This buried structure consisted in adding a heavily doped p+ thin layer on the top of the n layer of the pn junction making it a vertical p+np structure.…”
Section: Brief Historical Reviewmentioning
confidence: 99%
“…In this structure, the surface under the silicon di-oxide is pinned by holes during the photo signal accumulation to reduce the electron generation by interface states located at Si − SiO 2 interface. This greatly reduces the dark current [5]. Each impurity concentration is elaborately controlled so that accumulated charges in the photodiode are completely removed in the reset operation.…”
Section: Pixel Structure and Operation Principlementioning
confidence: 99%
“…This problem can be solved by using a detector that has a linear and a logarithmic responses for low illumination and high illumination level, respectively [4]. In wide DR image sensors with logarithmic or linear-logarithmic responses, in order to expand the dynamic range to the low illumination level, a pixel structure with pinned photodiode [5] should be employed. The pinned photodiode structure can reduce the dark current significantly, and the reset noise can be canceled by in-pixel charge transfer and correlated double sampling (CDS) at the column readout circuit [6].…”
Section: Introductionmentioning
confidence: 99%
“…This model of the system provides an enhanced level of accuracy at the output with less amount of unwanted noise signal. The most effected parameter of this system is the channel resistance which in turn detoriates the overall performance of the system [35][36][37][38][39][40][41][42][43][44][45][46].…”
Section: Design and Implementation Of The Soc Based Smart Cmos Pixmentioning
confidence: 99%