Nitrogen-driven<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi>sp</mml:mi></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math>to<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi>sp</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math>transformation in carbon nitride materials

Hu, Jiangtao; Yang, Peidong; Lieber, Charles M.

doi:10.1103/physrevb.57.r3185

Cited by 207 publications

(60 citation statements)

References 22 publications

(35 reference statements)

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“…This trend indicates that substantial amounts of nitrogen atoms are also etched by the incoming species. The liberated nitrogen atoms recombine to form N 2 molecules, which can either diffuse to the surface or stay inside the film inducing the formation of voids (low density) [7,13,14]. The ERDA and NRA measurements confirm these arguments and reveal a systematic presence of a significant amount of hydrogen and oxygen.…”

Section: Resultssupporting

confidence: 68%

“…The modes at 1400 and 1570 cm À1 are still debated [5,6,8]. The absorption band lying between 2000 and 2500 cm À1 suggests the presence of the chemical groups isonitrile and nitrile (triple bonded CN), which may terminate a chain and, thus, determines the extent of the void structure [7,14]. This result is confirmed by the band around 3400 cm À1 , associated with the OH vibration, suggesting a high atmospheric contamination by oxygen and water in good agreement with the ERDA and NRA results discussed above.…”

Section: Resultsmentioning

confidence: 99%

“…One of the key factors in determining the structure of amorphous carbon is the hybridation state of the atoms that form the amorphous network. However, the detailed mechanism of the nitrogen incorporation caused by the deposition conditions during growth is not fully understood [4][5][6][7]. Thus, the correlation between the vibrational analysis and the physical properties of the a-CN x is still debated [5 -11].…”

Section: Introductionmentioning

confidence: 99%

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Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth

Durand-Drouhin¹,

Benlahsen²,

Clin³

et al. 2004

Diamond and Related Materials

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Section: Resultssupporting

confidence: 68%

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth

Durand-Drouhin¹,

Benlahsen²,

Clin³

et al. 2004

Diamond and Related Materials

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“…As a result, the disordered structure reduces the energy by relaxing some compressive stress, which eventually favor the formation of sp 2 bonds [60,61]. Jiang et al [62] described that above 12% nitrogen concentration more sp 2 carbon bonds are formed by preferential thermodynamic and kinetic reactions. Wang et al [61] pointed out that sp 2 bonded carbon atoms increases with increasing nitrogen partial pressure.…”

Section: Materials Characterization Resultsmentioning

confidence: 99%

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Rashid

Archenti

2018

Nanomanuf Metrol

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A thick 400-micron amorphous carbon nitride (a-CN X ) coating material was synthesized by means of plasma-enhanced chemical vapor deposition process. High-power impulse magnetron sputtering technique was used to sputter a pure graphite target plate in reactive argon (Ar), nitrogen (N 2 ) and acetylene (C 2 H 2 ) environment for depositing the composite coating. Structural and chemical/elemental composition of the a-CN X composite material was investigated by field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy and micro-Raman spectroscopy. The rootmean-square surface roughness (S q ) and structure were estimated by atomic force microscopy. Mechanical properties such as hardness and Young's modulus (Oliver-Pharr method) at room temperature were characterized by Vickers microindentation test. Operational temperature test of the deposited a-CN X coating reveals that it can withstand up to 400°C without cracking. An inverted shaker test, based on central impedance method, was adopted to investigate the dynamic damping property of the coating material, and it was found that the first bending mode damping lossfactor of the reported a-CN X coating is 0.015 ± 0.001 and corresponding loss modulus (Young's modulus multiplied by lossfactor) is 0.234 ± 0.011 GPa.

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“…Compared with pristine TiO 2 , TiO 2 /CM, and TiO 2 /CMB show the transitions of 1s → B* and 1s → σ * in both carbon K edge and nitrogen K edge. More importantly, the relative intensities of the two transitions (the 1s → B* transition peaks are very sharp and intense for TiO 2 /CM and TiO 2 /CMB) demonstrated that the outer layers of the TiO 2 /C 3 N 4 nanoparticles exclusively consisted of sp 2 hybridized carbon and nitrogen atoms, [16] which further proves the thin layers are composed of carbon nitride. Corresponding selected area electron diffraction patterns illustrates that the C 3 N 4 does not have obvious impact on the crystallinity of the TiO 2 nanoparticles ( Figure S4, Supporting Information).…”

mentioning

confidence: 84%

The Complex Role of Carbon Nitride as a Sensitizer in Photoelectrochemical Cells

Herrãiz‐Cardona

Yang

et al. 2015

Advanced Optical Materials

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In the last years, enormous attention has been focused on the metal-free semiconductor graphitic carbon nitride (simplified as C 3 N 4 ) with a bandgap of 2.7 eV, which holds a great promise in the fields of electrocatalysis, [1] bioimaging, [2] solar cells, [3] and especially photocatalysis. [4,5] Many approaches were introduced to enhance the photoactivity of C 3 N 4 , such as doping [6] with different heteroatoms and by surface area increase, usually by hard-templating method.[5] Recently, an easy, safe, and highly effective approach has been developed to promote the photocatalytic activity of C 3 N 4 , which employs supramolecular precursors for thermal polymerization into C 3 N 4 . The supramolecular complex is generated by combining different organic compounds (triazine derivatives) in solvents and then assemblies are formed because of noncovalent interactions such as hydrogen bonds. Typically, cyanuric acid-melamine system has been shown to yield preorganized micro/nanostructures and morphologies, and as a result enables the modification of optical and electrical properties of final C 3 N 4 product and significant improvement of photoactivity. [7] Moreover, the final material composition can be tuned by the insertion of other molecules (e.g., barbituric acid) into the starting complex.As stated before, C 3 N 4 features good stability over high temperature and corrosive chemical environments.[8] C 3 N 4 has been frequently used in combination with other semiconductor materials, such as MoS 2 , [9] In 2 O 3 , [10] and Ag 3 PO 4 , [11] for better light harvesting. When the chemistry is successfully executed, heterojunctions are formed between C 3 N 4 and the other component, which improve the charge separation process and the overall performance. However, while the high activity of C 3 N 4 as photocatalyst is well understood and studied, its performance in photoelectrochemical cells (PEC) remained low due to a more complicate charge separation/transport process. In order to promote PEC performance, uniform, continuous, and well-attached thin film electrodes should be produced. Furthermore, it is crucial to better understand the photophysical properties and the chemical interactions of carbon nitride materials in such systems. Herein, we carefully studied the chemical interactions alongside the photophysical properties of TiO 2 /C 3 N 4 in a model photoelectrochemical cell. A TiO 2 /C 3 N 4 hybrid thin film was prepared by an in situ vapor-transport growth mode, using cyanuric acid-melamine (CM) or cyanuric acid-melaminebarbituric acid (CMB) supramolecular complexes as the precursor (labeled here as TiO 2 /CM and TiO 2 /CMB, respectively). The hybrid materials were characterized using a range of techniques (summarized in Table S1, Supporting Information). After thermal polymerization, the 20-nm TiO 2 nanoparticles were uniformly coated with 3-5 nm of C 3 N 4 layers. The TiO 2 /C 3 N 4 system showed unique electronic coupling, leading to a greatly modified electronic structure and enhanced optical absorptio...

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Nitrogen-drivensp3tosp2transformation in carbon nitride materials

Cited by 207 publications

References 22 publications

Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth

Atomic rearrangement of sputtered amorphous carbon nitride thin films during growth

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

The Complex Role of Carbon Nitride as a Sensitizer in Photoelectrochemical Cells

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