Nitriding in a Helicon Discharge as a Promising Technique for Changing the Surface Properties of Steel Parts

Abstract

The main types of state-of-the-art nitriding technologies, their advantages and disadvantages are considered. An innovative technology of ion nitriding in high-frequency helicon-discharge plasma is proposed. The hardening of steel samples via ion nitriding in a helicon discharge is experimentally revealed that (in a wide range of operating parameters) allows us to have an influence on the process of diffusion saturation with nitrogen atoms. The results of microhardness measurements along the depth of nitrided steel samples are presented (the steel grade is C45 according to the European standard EN 10027). The possibility of controlling the gradient of the tribotechnical properties of friction parts by changing the parameters of the technological process of ion nitriding in a helicon discharge is shown.

Defining technological features in the manufacture of semi-hard book covers

“…The improvement of the physical and mechanical characteristics, at the final stage of modifying the surface strength of the rollers, implies the use of an ionic nitriding technology in the plasma of the helicon discharge [20]. As a result, those diffusion processes that cause the formation of a new structuralphase state of the surface, different from the core, change the composition of the near-surface area of the rollers' metal.…”

“…To improve the physical and mechanical characteristics of the near-surface layer, the final stage of modifying the surface strength of the rollers employs the technology of ionic nitriding in the hydrogen-free environment, in the plasma of the helicon discharge [20]. The result of such a treatment is the changed composition of the near-surface zone of the rollers' metal, due to the diffusion processes that cause the formation of a new structural and phase state, different from that of the core.…”

Вплив Технологічних Режимів Обробки Латунної Основи На Якість Форм Інтагліодруку

“…Модельну форму після відповідної процедури очищення було оброблено у плазмі геліконного розряду за допомогою установки для іонно-плазмового формування вуглецевих нанотрубок та інших наноструктур [9,10]. Час обробки становив 10 та 45 хв; технологічні параметри обробки зразків мали незначну варіацію (табл.…”