Abstract:Stainless steel films were reactively magnetron sputtered in argon/nitrogen gas flow onto oxidized silicon wafers using austenitic AISI 316 stainless‐steel targets. The deposited films of about 300 nm thickness were characterized by conversion electron Mö‐i;ssbauer spectroscopy, magneto‐optical Kerr‐effect, X‐ray diffraction, Rutherford backscattering spectrometry, and resonant nuclear reaction analysis. These complementary methods were used for a detailed examination of the nitriding effects for the sputtered… Show more
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