NiSx@MoS2 heterostructure prepared by atomic layer deposition as high-performance hydrogen evolution reaction electrocatalysts in alkaline media

He, Zuyun; Guo, Zheng; Wa, Qingbo; Zhong, Xiaoyan; Wang, Xinwei; Chen, Yan

doi:10.1557/jmr.2019.325

Cited by 16 publications

(13 citation statements)

References 55 publications

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“…Furthermore, Th-ALD-grown NiS x was deposited on MoS 2 to construct heterointerfaces, which served as active sites for the HER. [186] Even for the most efficient catalyst, the number of cycles must be precisely controlled to avoid the decrease of the triple-phase boundary region (NiS x , MoS 2 , and electrolyte). The metallic TMC amorphous CoS x performed better than crystalline CoS x .…”

Section: Energy Conversionmentioning

confidence: 99%

Atomic‐Layer‐Deposition‐Based 2D Transition Metal Chalcogenides: Synthesis, Modulation, and Applications

et al. 2021

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V, Fe, Co, and Ni chalcogenides exhibit diverse stoichiometric phases with different electrical properties. [28][29][30] For example, TiS 3 is a semiconductor, while TiS 2 exhibits metallic properties. [30,31] Owing to their electrical conductivity, metallic TMCs can be used for energy conversion (including the hydrogen evolution reaction (HER) and oxygen evolution reaction (OER)) and energy storage (Li-ion batteries (LIBs), Na-ion batteries (NIBs), and supercapacitors). [29,32] Industrially compatible synthesis methods and applications are of key importance in the research of new materials. Therefore, atomic layer deposition (ALD)-based 2D TMC materials, which are applicable in industries, have been investigated. [33][34][35][36] Initially, 2D TMCs were mechanically exfoliated to determine their single-crystal characteristics. [11,20] However, the large-area synthesis and control of the layer number of TMCs are crucial. [2,37] ALD, which is a suitable synthesis method for 2D TMCs, is based on the surface reactions of the alternately supplied vapor-phase precursors. [38,39] Because it is one of the most powerful deposition methods for synthesizing uniform thin films on large areas, the next-generation low-power/ high-efficiency electronic and energy applications of materials synthesized/modified by ALD processes have been studied. [38,39] For industrial applications, the electrical, optical, and physical properties of 2D TMCs need to be improved. [18,[40][41][42][43] In addition to the synthesis of 2D TMCs, the ALD method can be used to modify 2D TMCs. In particular, the performance of 2D TMCs can be improved by depositing other materials on 2D TMCs via ALD. [44] By depositing metal oxide thin films or metal nanoparticles on 2D TMCs by ALD, the electrical properties of 2D TMC materials can be precisely controlled, the catalyst efficiency can be modulated, and strain can be induced to change the physical properties of the 2D TMCs. [45][46][47] However, because of their unique structures, ALD on 2D TMCs is quite challenging. For example, the film growth behavior on 2D TMCS is significantly different from the film growth behavior on 3D materials during ALD because of the absence of chemical sites on 2D TMCs. [48][49][50][51] Therefore, for thin film deposition on 2D TMCs by ALD, researchers have focused on improving the uniformity of thin films or synthesizing low-dimensional nanomaterials on 2D TMCs.Herein, the synthesis of 2D TMCs by ALD is reviewed and the synthesis methods are classified based on different types of ALD methods. The synthesis of TMCs by the ALD of transition Transition metal chalcogenides (TMCs) are a large family of 2D materials with different properties, and are promising candidates for a wide range of applications such as nanoelectronics, sensors, energy conversion, and energy storage. In the research of new materials, the development and investigation of industry-compatible synthesis techniques is of key importance. In this respect, it is important to study 2D TMC materials synthesized by th...

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Section: Energy Conversionmentioning

confidence: 99%

Atomic‐Layer‐Deposition‐Based 2D Transition Metal Chalcogenides: Synthesis, Modulation, and Applications

et al. 2021

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“…NiS x @MoS 2 heterostructure electrocatalysts with controllable interface properties were synthesized by depositing NiS x on MoS 2 nanosheets using ALD. 74 Compared with single-phase MoS 2 and NiS x , NiS x @MoS 2 heterojunctions have lower over potential and faster reaction kinetics, which greatly enhanced the HER activity. The improved catalytic performance is attributed to the optimized adsorption of reaction intermediates and the promoted charge transfer near the MoS 2 /NiS x interface.…”

Section: Applicationsmentioning

confidence: 99%

Surface modification and functionalization of powder materials by atomic layer deposition: a review

Lü

Feng

2021

RSC Adv.

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“…KOH versus RHE) pointing to efficient formation of NiS x /MoS 2 heterointerfaces facilitating the electron transfer process. [ 69 ] Similarly to MoS 2 , the electrocatalytic properties of various forms of CoS 2 were reported. [ 70 ] However, none of these materials was prepared by the ALD technique and the reports on preparation of cobalt sulfides for the purpose of HER investigation are relatively scarce.…”

Section: Hydrogen Evolution Reactionmentioning

confidence: 99%

“…[ 67 ] These deposits exhibited high stability at high current density (100 mA cm −2 ) reached at overpotential ≈−280 mV. Similarly, NiS x deposited on FTO wafers [ 68 ] or onto MoS 2 nanosheets [ 69 ] starting with bis( N,N′ ‐di‐ tert ‐butylacetamidinato)nickel(II) and H 2 S as the precursors at ≈120 °C, has exhibited good performance in the HER in both, acidic or alkaline conditions. Although the value of the overpotential of the FTO‐deposited sulfide (−440 mV at −10 mA cm −2 ) reflects only a moderate activity of this system, the activity of the NiS x @MoS 2 composite was significantly higher.…”

Section: Hydrogen Evolution Reactionmentioning

confidence: 99%

Applications of Atomic Layer Deposition in Design of Systems for Energy Conversion

Plutnar

Pumera

2021

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There is a huge demand for clean energy conversion in all industries. The clean energy production processes include electrocatalytic and photocatalytic conversion of water to hydrogen, carbon dioxide reduction, nitrogen conversion to ammonia, and oxygen reduction reaction and require novel cheap and efficient photo‐ and electrocatalysts and their scalable methods of fabrication. Atomic layer deposition is a thin film deposition method that allows to deposit thin layers of catalysts on virtually any surface of any shape, size, and porosity in an even and easy to control manner. Here the state of the art in applications of atomic layer deposition in the clean energy production and the opportunities it represents for the whole field of the photo‐ and electrocatalysis for a sustainable future are reviewed.

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NiS_x@MoS₂ heterostructure prepared by atomic layer deposition as high-performance hydrogen evolution reaction electrocatalysts in alkaline media

Abstract: Abstract

Cited by 16 publications

References 55 publications

Atomic‐Layer‐Deposition‐Based 2D Transition Metal Chalcogenides: Synthesis, Modulation, and Applications

Atomic‐Layer‐Deposition‐Based 2D Transition Metal Chalcogenides: Synthesis, Modulation, and Applications

Surface modification and functionalization of powder materials by atomic layer deposition: a review

Applications of Atomic Layer Deposition in Design of Systems for Energy Conversion

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