2008
DOI: 10.1143/jjap.47.584
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(Ni,Cu)O Phase in Thin Films Prepared by Pulsed Laser Deposition

Abstract: Nickel copper oxide [(Ni 1Àx Cu x )O] thin films in which Cu content x was changed from 0 to 1 were prepared by pulsed laser deposition. The copper content of the thin films was determined by energy-dispersive X-ray analysis with scanning electron microscopy. Transmission electron microscope observation of the thin films with x ¼ 0:37 revealed that the thin films contained grains consisting of Ni, Cu, and O. Both interplanar distances and lattice constant increased with increasing copper content. The (Ni 1Àx C… Show more

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“…Preparation of thin films in a nonequilibrium state can be realized by physical vapor deposition techniques, and we have succeeded in the synthesis of various metastable materials by pulsed laser deposition (PLD). [21][22][23] In previous research 24) , it was clarified that both interplanar distances and lattice constants increased with increasing copper content, and the (Ni 1-x Cu x )O phase with 0<x<0.27 has a B1 structure. The purpose of the present investigation was to prepare supersaturated (Ni,Cu)O thin films with x>0.27 by PLD, to determine the crystal structure of the (Ni,Cu)O thin films, and to discuss a crystal distortion factor by Cu 2+ solution into NiO.…”
Section: Introductionmentioning
confidence: 99%
“…Preparation of thin films in a nonequilibrium state can be realized by physical vapor deposition techniques, and we have succeeded in the synthesis of various metastable materials by pulsed laser deposition (PLD). [21][22][23] In previous research 24) , it was clarified that both interplanar distances and lattice constants increased with increasing copper content, and the (Ni 1-x Cu x )O phase with 0<x<0.27 has a B1 structure. The purpose of the present investigation was to prepare supersaturated (Ni,Cu)O thin films with x>0.27 by PLD, to determine the crystal structure of the (Ni,Cu)O thin films, and to discuss a crystal distortion factor by Cu 2+ solution into NiO.…”
Section: Introductionmentioning
confidence: 99%