2015
DOI: 10.1117/12.2175553
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New ways of looking at masks with the SHARP EUV microscope

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Cited by 9 publications
(5 citation statements)
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“…Comparing the measured contrast transfer function results presented in Ref. [10] to the simulation results an ideal diffraction limited system (Fig. 12), we find the patterned zoneplate to be operating at the diffraction limit.…”
Section: Fresnel Zoneplate Pattern Fabrication Demonstrationmentioning
confidence: 59%
“…Comparing the measured contrast transfer function results presented in Ref. [10] to the simulation results an ideal diffraction limited system (Fig. 12), we find the patterned zoneplate to be operating at the diffraction limit.…”
Section: Fresnel Zoneplate Pattern Fabrication Demonstrationmentioning
confidence: 59%
“…Simulations indicate that we are able to recover the aberrations with relative error under 3% with respect to true Zernike coefficient values. These results allow an analysis of the tool performance beyond the experimental demonstration of diffraction-limited imaging [6], using a readily available mask blank.…”
Section: © 2 0 1 8 T H E Au T H O R ( S )mentioning
confidence: 97%
“…Our experiments were done on SHARP [6] at Lawrence Berkeley National Lab, a synchrotron-based full-field EUV microscope, featuring a Fourier synthesis illuminator [7] to steer the illumination angle. The mask blank was coherently illuminated with a central ray angle of 6 • , and imaged using an off-axis Fresnel zoneplate (120 µm diameter, 500 µm focal length, 0.082 NA).…”
mentioning
confidence: 99%
“…In practice, such microscopes typically limit the quality imaging region to the center 1 to 3 µm. These results allow an analysis of the tool performance beyond the experimental demonstration of diffraction-limited imaging 40 , using a readily available photomask blank.…”
Section: Objective Aberration Characterizationmentioning
confidence: 97%