Field-varying aberration recovery in EUV microscopy using mask roughness

Abstract

We derive and solve a simplified, self-calibrated inverse problem to characterize the field-dependent aberrations of an EUV synchrotron-based full-field microscope, using images of the surface roughness of an EUV photomask under several angles of illumination. We demonstrate diffraction-limited imaging performance at the center of its field-of-view.