New spin on carbon materials made from hemicellulose for hardmask layer

Morita, Kazuyo; Yamamoto, Kimiko; Hongo, Koki; Harumoto, Masahiko; Tanaka, Yuji; Nakayama, Chisayo; Arisawa, You; Stokes, H. W.; Asai, Masaya

doi:10.1117/12.2297333

Cited by 1 publication

(2 citation statements)

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“…developed a family of sugar-containing methacrylate polymers as negative tone resists. Also, Morita and co-workers introduced the use of hemicellulose as a spin on carbon hard-mask material . Accordingly, we investigate in this work the incorporation of a polymer of a galactose-containing methacrylate as the highly polar block in a BCP with PS.…”

Section: Introductionmentioning

confidence: 99%

“…Also, Morita and co-workers introduced the use of hemicellulose as a spin on carbon hard-mask material. 35 Accordingly, we investigate in this work the incorporation of a polymer of a galactosecontaining methacrylate as the highly polar block in a BCP with PS. To our knowledge, glycol methacrylates have not been used for self-assembly in the solid state and have been primarily utilized in therapeutic applications, such as in micelles and hydrogels for drug delivery and surface coatings for increased biocompatibility.…”

Section: ■ Introductionmentioning

confidence: 99%

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Galactose-Based Block Copolymers with Switchable χ Parameters for Tuning Phase Separated Morphology

et al. 2023

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Block copolymer (BCP) self-assembly has emerged over the past two decades as a promising method for generation of features for manufacture of integrated circuits and memory devices. Low-molecular-weight BCPs with blocks that are highly immiscible can generate features of dimensions below 10 nm. However, it is often challenging to select a common good solvent for high-χ BCPs to allow spin coating. In addition, controlling the alignment of phase separated morphologies with respect to the wafer and at the air interface may be challenging. Here, we prepare a series BCPs of polystyrene (PS) and poly-6-O-methacryloyl-Dgalactopyranose (PMAGal), where the polar galactose has been protected with more hydrophobic acetonides. The acetonide protecting groups could be deprotected with trifluoroacetic acid to yield the more polar galactose repeat units to increase the incompatibility of the sugar-containing block with the PS blocks. The bulk morphology of the protected and deprotected versions was studied using small-angle X-ray scattering, where the morphology could be switched from disordered for the protected BCP to either cylindrical or lamellar for the deprotected version or between two ordered phases. Finally, we demonstrate phase separation on the wafer via solvent vapor annealing with H 2 O/THF, resulting in lamellar patterning with domains as small as 14 nm.

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Section: Introductionmentioning

confidence: 99%

Section: ■ Introductionmentioning

confidence: 99%