New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps

Messerschmidt, Martin; Greer, Andrew I. M.; Schlachter, Florian; Barnett, Julian; Thesen, Manuel W.; Gadegaard, Nikolaj; Grützner, Gabi; Schleunitz, Arne

doi:10.2494/photopolymer.30.605

Cited by 11 publications

(7 citation statements)

References 9 publications

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“…The pattern height was over 500 nm from the sixth imprinting cycle. Messerschmidt et al [16] reported that a rectangle pattern was obtained using the same soft UV-PDMS mold and organic UV-curable resin with low viscosity (~50 cP) nanoimprinted with only capillary filling (pressure free) in a standard mask aligner. In this study, we used an inorganic/organic hybrid polymer with medium viscosity (~1500 cP) as the imprint material and the mechanical imprint pressure was 0.1 MPa.…”

Section: Resultsmentioning

confidence: 99%

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Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Suzuki

Youn

Hiroshima

2018

J. Photopol. Sci. Technol.

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Bubble-free filling needs to be achieved to realize high-throughput mass production in ultraviolet nanoimprint lithography (UV-NIL). Polydimethylsiloxane (PDMS) is a gastransmittable material because of its molecular features and is used as the base material for flexible molds in large-area UV-NIL. In this work, we investigated the filling behavior and mold release force of UV-NIL using a soft UV-curable PDMS mold in different atmospheres. Bubble-free filling was successfully demonstrated in air and 1,1,1,3,3-pentafluoropropane (PFP) gas atmosphere. The average release force following UV-NIL in PFP was 5.2 N, which was 70% smaller than that following UV-NIL in air. Defect-free fine nanopatterns with a width of 300 nm were fabricated by UV-NIL in PFP atmosphere.

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Section: Resultsmentioning

confidence: 99%

“…Soft UV-curable PDMS (UV-PDMS) has the advantage of simple mold replication by UV curing at room temperature, which leads to low film shrinkage. Messerschmidt et al [16] demonstrated 30 consecutive imprinting cycles without any defects using soft UV-PDMS and organic UVcurable resin with low viscosity (~50 cP).…”

Section: Introductionmentioning

confidence: 99%

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Suzuki

Youn

Hiroshima

2018

J. Photopol. Sci. Technol.

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“…The substrates were cleaned in acetone and IPA for about 10 min each, and then a short oxygen plasma treatment for 10 min was applied in order to obtain the hydrophilic surface. The mr-NIL210 resist [ 54 ] at two standardized versions—200 and 500 nm—was used after prior deposition of an adhesion layer mr-APS1 (acquired both from micro resist technology GmbH, Germany).…”

Section: Methodsmentioning

confidence: 99%

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

et al. 2021

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This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The designed metasurface makes use of the geometrical phase principle and consists of rectangular pillars with target dimensions of height h = 1200 nm, width w = 230 nm, length l = 354 nm and periodicity p = 835 nm. The simulated efficiency of the lens is 60%, while the master lenses obtained by using electron beam lithography are found to have an efficiency of 45%. The lenses subsequently fabricated via nanoimprint are characterized by an efficiency of 6%; the low efficiency is mainly attributed to the rounding of the rectangular nanostructures during the pattern transfer processes from the resist to silicon due to the presence of a thicker residual layer.

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“…NIL was initially used as a purely lithographic method, for pattern transfer [ 10 ] as a fast and cheap alternative to electron beam lithography. In recent years, a new trend has emerged towards direct patterning of functional materials, where the imprinted structures are directly used as active elements in devices.…”

Section: Introductionmentioning

confidence: 99%

Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups

et al. 2020

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We present here a novel resist formulation with active thiol groups at the surface. The material is UV curable, and can be patterned at the micro- and nanoscale by UV nanoimprint lithography. The resist formulation development, its processing, patterning and surface characterization are presented here. In addition, a possible application, including its use to modify the electrical properties of graphene devices is shown. The cured material is highly transparent, intrinsically hydrophilic and can be made more hydrophilic following a UV-ozone or an O2 plasma activation. We evaluated the hydrophilicity of the polymer for different polymer formulations and curing conditions. In addition, a protocol for patterning of the polymer in the micro and nanoscale by nanoimprinting is given and preliminary etching rates together with the polymer selectivity are measured. The main characteristic and unique advantage of the polymer is that it has thiol functional groups at the surface and in the bulk after curing. These groups allow for direct surface modifications with thiol-based chemistry e.g., thiol-ene reactions. We prove the presence of the thiol groups by Raman spectroscopy and perform a thiol-ene reaction to show the potential of the easy “click chemistry”. This opens the way for very straightforward surface chemistry on nanoimprinted polymer samples. Furthermore, we show how the polymer improves the electrical properties of a graphene field effect transistor, allowing for optimal performance at ambient conditions.

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New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps

Cited by 11 publications

References 9 publications

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

Development, Processing and Applications of a UV-Curable Polymer with Surface Active Thiol Groups

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