Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. 2004
DOI: 10.1109/vlsit.2004.1345444
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New highly scalable 3 dimensional chain FeRAM cell with vertical capacitor

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Cited by 16 publications
(7 citation statements)
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“…FeRAMs are commercially available in Texas Instruments' microprocessors and Fujitsu's RF tags [222][223][224]. The commonly used ferroelectric material in FeRAM is lead zirconium titanate (Pb1.1Zr0.48Ti0.52O3-PZT) due to its high switching speed [225,226], low cost per bit ($/bit), and low operation voltage [227,228]. Hence, the best properties for flexible NVM FeRAM are reported for structures incorporating PZT as the ferroelectric material, as evident from Table 6.…”
Section: Flexible Ferammentioning
confidence: 99%
“…FeRAMs are commercially available in Texas Instruments' microprocessors and Fujitsu's RF tags [222][223][224]. The commonly used ferroelectric material in FeRAM is lead zirconium titanate (Pb1.1Zr0.48Ti0.52O3-PZT) due to its high switching speed [225,226], low cost per bit ($/bit), and low operation voltage [227,228]. Hence, the best properties for flexible NVM FeRAM are reported for structures incorporating PZT as the ferroelectric material, as evident from Table 6.…”
Section: Flexible Ferammentioning
confidence: 99%
“…Besides having a capacitor-type cell, a FeRAM has a transistor-type cell and a chain cell, 31) which are more suitable for applications requiring a larger memory capacity. A transistor-type cell has a structure similar to that of a MOS transistor, except the gate oxide is replaced with a ferroelectric oxide.…”
Section: Transistor-type Feramsmentioning
confidence: 99%
“…Beside a capacitor type cell, FeRAM has a transistor type and a chain cell [5] type that are more suitable for high density application. A transistor type cell has a structure like a MOS transistor but the gate oxide is replaced with a ferroelectric oxide.…”
Section: Ferammentioning
confidence: 99%