2001
DOI: 10.1063/1.1341209
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Neutron diffraction study on the defect structure of indium–tin–oxide

Abstract: The defect structure of undoped and Sn-doped In2O3 (ITO) materials was studied by preparing powders under different processing environments and performing neutron powder diffraction. The effect of tin doping and oxygen partial pressure was determined. Structural information was obtained by analyzing neutron powder diffraction data using the Rietveld method. The results include positions of the atoms, their thermal displacements, the fractional occupancy of the interstitial oxygen site, and the fractional occup… Show more

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Cited by 146 publications
(95 citation statements)
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“…At the highest Sn doping levels there is evidence [98][99][100][101] for further aggregation of Sn ions and interstitials to give so called "non-reducible" clusters. The 6-coordinate ionic radius of Sn 4+ in the Shannon and Prewitt tabulation [102] has a value of 0.83 Å, which is 0.11 Å smaller than the value of 0.94 Å for In 3+ .…”
Section: Bulk N-type Doing: Chemical Aspectsmentioning
confidence: 98%
“…At the highest Sn doping levels there is evidence [98][99][100][101] for further aggregation of Sn ions and interstitials to give so called "non-reducible" clusters. The 6-coordinate ionic radius of Sn 4+ in the Shannon and Prewitt tabulation [102] has a value of 0.83 Å, which is 0.11 Å smaller than the value of 0.94 Å for In 3+ .…”
Section: Bulk N-type Doing: Chemical Aspectsmentioning
confidence: 98%
“…It is known that high oxygen pressure can significantly reduce the conductivity of doped oxides due to the formation of neutral complexes between the ionized dopants and the interstitial oxygen atoms [56,73,74]. Indeed, it was shown [61] that interstitial oxygen in Mo-doped In 2 O 3 may significantly affect the electronic, magnetic and optical properties of the material.…”
Section: V4 Charge Compensation With Interstitial Oxygenmentioning
confidence: 99%
“…[12,30] Note, however, that the FIB ions are singly charged Ga þ , and could potentially introduce greater complexity in the doping mechanism compared to that of previously studied Ga-doped In 2 O 3 systems.…”
Section: à3mentioning
confidence: 94%
“…Thus, it is evident that Ga doping imbues In 2 O 3 with electrical properties suitable for device applications. The doping mechanism is most likely increased oxygen vacancy concentration, [30] since Ga and In are isovalent and thus donor-or acceptor-type doping is not expected. The increased conductance of the patterns produced here is likely due to a locally increased carrier concentration created by oxygen vacancies, Figure 2.…”
Section: à3mentioning
confidence: 99%