“…Ion mobilities are orders of magnitude smaller than electron or hole mobilities in semiconductors, which means the ionic resistance of the intervening electrolyte between the gate electrode and the semiconductor channel is relatively large. This ionic resistance can be viewed as a parasitic resistance R p in series with the gate, and it is dependent on intrinsic electrolyte conductivity, electrolyte thickness, and cross-sectional area. − As we demonstrate below, for an EGT-based circuit, it can unfortunately be the case that the limiting ON-state resistance R total ON controlling signal propagation delay is not determined by the semiconductor channel resistance R channel ON or the source–drain contact resistance R contact ON , but rather is dominated by R p due to slow ion motion in the electrolyte (i.e., R total ON = R channel ON + R contact ON + R p , where R p dominates). − We, and others, have measured ionic conductivity for gel electrolyte films based on ionic liquids and polymers and found it to be as large as 4 mS/cm depending on the precise gel composition. − Thus, for typical EGTs with channel areas of ∼1000 μm 2 , and gel film thicknesses of ∼1 μm, R p is on the order of 1 kΩ, which is a large value. Less resistive, ultrathin gate–electrolyte films are a clear goal for EGTs .…”