Negative EB Resist Materials Using Anisotropic Acid-Diffusion Based on Acid-Catalyzed Dehydration of Phenylcarbinols.

Abstract

Negative electron beam resists composed of a phenylcarbinol, poly(4-hydroxystyrene) (PHS), and an onium salt have been developed to define patterns below 100-nm. Five phenylcarbinols were evaluated as a precursor of a dissolution inhibitor (PDI) and a water generator (WAG) which induces anisotropic acid-diffusion. 1,3,5-tris(2-(2hydroxypropyl))benzene (Triol(3)) was found to be the best PDI and WAG among the phenylcarbinols evaluated. Acid-diffusion measurement in a resist film containing Triol(3) clearly shows that the acid-diffusion coefficient in the exposed region is larger than that of the unexposed region. A resist consisting of PHS, Triol(3), and diphenyliodonium triflate (DIT) exhibits enough resolution (80-nm L&S), sensitivity (5-pC/cm2 at 50kV), and critical dimension control to define 100-nm L&S patterns. Spectroscopic studies indicate that the acid-catalyzed 0-alkylation of PHS hydroxyl groups by Triol(3) is responsible for the resist insolubilization.

Impact of acid/quencher behavior on lithography performance

“…Though acid diffusion in resist films has widely been investigated [2][3][4], few attempt has been made to measure diffusion behavior of quencher in resist films. We previously measured diffusion coefficients of several quencher compounds using the "paste and diffuse" method, which is schematically illustrated in Fig.…”

Negative Electron Beam Resists Using Ring-Chain Tautomerism of Benzoic Acid Derivatives

“…[4,5,6] In this article we describe a newly developed resist that uses the ring-chain tautomerism of oacetylbenzoic acid. The formulation, lithographic performance, and insolubilization mechanism of the new resist are discussed.…”

Ανάπτυξη Πρότυπων Σιλοξανικών Και Σιλεναμισοξανικών Πολυμερικών Υλικών Για Λιθογραφία Υψηλής Διακριτικής Ικανότητας

“…Συνεπώς , η διάχυση οξέος σε υλικά χημικής ενίσχυσης είναι ιδιαιτέρως πολύπλοκη και διαφέρει σε πολλά σημεία από την διάχυση αδρανών (μικρού μεγέθους) μορίων εντός πολυμερικής μήτρας. Έχουν παρουσιαστεί αρκετές πειραματικές μέθοδοι χαρακτηρισμού της διάχυσης του οξέος [79][80][81][82] καθώς και τεχνικές προσομοίωσης. 83 Στις περισσότερες αναφορές οι συντελεστές διάχυσης κυμαίνονται από 10 -6 -10 -4 μm 2 /s, τιμές αισθητά χαμηλότερες από τις τυπικές τιμές για διάχυση μικρών μορίων εντός υαλώδους πολυμερούς.…”