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2016
DOI: 10.1109/led.2015.2501319
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Negative Capacitance in Short-Channel FinFETs Externally Connected to an Epitaxial Ferroelectric Capacitor

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Cited by 208 publications
(101 citation statements)
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“…The fact that the ferroelectric material can exhibit such a state of negative capacitance has already been demonstrated. 3,4,[6][7][8][9][10][11][12][13][14][15][16][17][18] Therefore, if another dielectric capacitor is placed in series with the ferroelectric [as shown schematically in Fig. 1(b)], a voltage amplification is expected across the dielectric capacitor.…”
mentioning
confidence: 99%
“…The fact that the ferroelectric material can exhibit such a state of negative capacitance has already been demonstrated. 3,4,[6][7][8][9][10][11][12][13][14][15][16][17][18] Therefore, if another dielectric capacitor is placed in series with the ferroelectric [as shown schematically in Fig. 1(b)], a voltage amplification is expected across the dielectric capacitor.…”
mentioning
confidence: 99%
“…In [9], Q G shows only a weak dependence on V DS which makes DIBL more predominant than DIBR. In a different setting where Q G becomes a stronger function of V DS , we may expect appearance of both NDR and DIBR.…”
Section: B Drain-induced Barrier Raising (Dibr)mentioning
confidence: 97%
“…The key difference between the structure of NCFETs and conventional MOSFETs is the presence of a ferroelectric material in the gate stack. As in the case of recent experiments [8] [9], the ferroelectric and baseline MOSFET in our work are supposed to be spatially separated, but connected by a metal layer with the same contact area, which provides the same gate charge density (Q G ) to both the internal gate and ferroelectric surfaces. The channel length (L ch ) and T F E are subject to variation, whereas the channel thickness (T Si ) and equivalent oxide thickness (EOT) are assumed to be 5 and 2 nm, respectively.…”
Section: Simulation Approachmentioning
confidence: 99%
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“…[129,130] In 2015, a combination of the FinFET and NCFET structures termed NC-FinFET was proposed and experimentally verified to exhibit an SS of 55 mV dec −1 . [50,[61][62][63][64]131,132] Figure 9a,b presents the structure and test results of a relatively early NC-FinFET. [50,[61][62][63][64]131,132] Figure 9a,b presents the structure and test results of a relatively early NC-FinFET.…”
Section: Nc-finfetmentioning
confidence: 99%