Near-zero contact force atomic force microscopy investigations using active electromagnetic cantilevers

Abstract

Atomic force microscopy (AFM) belongs to the high resolution and high sensitivity surface imaging technologies. In this method force interactions between the tip and the surface are observed to characterize sample properties. In the so-called contact AFM (C AFM) mode the tip is brought into continuous contact with the sample. Significant progress in the AFM technology can be obtained, when the so-called active cantilever technology is implemented in the surface measurements. The built-in deflection actuator enables very precise excitation of the cantilever. Moreover, as the mass of the beam is very small the static beam displacement can be controlled in the wide frequency range. In the experiments, which we describe in this article, we applied the so called active electromagnetic cantilevers. They integrate a conductive loop which, when immersed in the magnetic field and biased with electric current, acts as an electromagnetic deflection actuator. The induced and precisely estimated Lorentz force, which is a function of bias current, cantilever geometry and magnetic field makes the cantilever deflect. Moreover, the probe stiffness can be calibrated with lower uncertainty as in the case of standard thermomechanical analysis. NZ AFM technology required application of a novel control algorithm, called PredPID, in which the cantilever bending caused by a proportional-integral-derivative (PID) block maintaining the constant load force was predicted.

Integration of Fluorescent, NV-Rich Nanodiamond Particles with AFM Cantilevers by Focused Ion Beam for Hybrid Optical and Micromechanical Devices

“…The particle was attached to the nano-manipulator with adhesive forces (depicted in Figure 1c). The particle was brought closer to the prepared AFM tip and then fixed by Pt(C) material (platinum nanocrystallites immersed in a carbon matrix) to the tip using the FEBID process [23]. The acceleration voltage of the focussed electron beam during the process was 2 kV.…”

MEMS displacement generator for atomic force microscopy metrology

“…All the AFM measurements were performed using a NanoMan Veeco Instruments microscope. The NanoScope Analysis 1.5 software was used for data processing [23]. The set-up is shown in figure 4.…”

Magnetic-Dielectric Cantilevers for Atomic Force Microscopy

“…Executed in a clean room, this process ensures batch production. Different methods of tipless cantilever synthesis, such as dry film photoresist lithography, bottom-up fabrication using photopolymerizable hydrogel, and focused ion beam lithography, have been previously reported [13][14][15][16][17]. However, the techniques for cantilever fabrication in AFM often elude the grasp of many researchers employing this microscopy method.…”