“…At close to room temperatures, the aggregation is provided by only the diffusion of anion vacancies (hereinafter, vacancies). The defects in the subsurface layer, unlike the defects in the bulk of the crystal does not diffuse at these temperatures [10]. This fact suggests that the activation energy of the diffusion for these defects in the subsurface layer is significantly higher than in the bulk of the crystal, where it is 1.07 eV [11,12].…”