2020
DOI: 10.1038/s41467-020-14439-1
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Near-field sub-diffraction photolithography with an elastomeric photomask

Abstract: Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional farfield photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical… Show more

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Cited by 38 publications
(21 citation statements)
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“…1 (kr d ). Using the small-argument approximation H (1) 1 (x) ≈ x 2 − j 2 πx we arrive at the same result (6). Note that the real part of this impedance equals the radiation resistance (per unit length) of a radiating current line, as it should.…”
Section: From Power-flow Conformal Anomalous Reflectors To Focusing Mirrorsmentioning
confidence: 58%
See 1 more Smart Citation
“…1 (kr d ). Using the small-argument approximation H (1) 1 (x) ≈ x 2 − j 2 πx we arrive at the same result (6). Note that the real part of this impedance equals the radiation resistance (per unit length) of a radiating current line, as it should.…”
Section: From Power-flow Conformal Anomalous Reflectors To Focusing Mirrorsmentioning
confidence: 58%
“…In microscopy, this limit impedes the resolution of imaging roughly around halfwavelength [5]. It also limits the ability to focus waves into a small spot (hot spot), which is important, in particular, for photolithography [6].…”
Section: Introductionmentioning
confidence: 99%
“…Electrodes in eDEP are generally made of electrically conductive materials, such as silver, brass, and gold. A range of methods, from conventional photolithography [ 62 , 63 ] to the latest 3D metal printing [ 64 , 65 ] technologies, for the fabrication of electrodes. The major drawbacks of using eDEP are Joule heating [ 27 , 31 , 32 , 33 ], fouling effects [ 33 ], and electrochemical reactions that generate toxic species mainly due to electrode disintegration [ 33 , 66 ].…”
Section: Discussionmentioning
confidence: 99%
“…They are photolithography, UV-lithography, e-beam lithography, soft lithography, scanning probe lithography, and nanolithography [37]. Photolithography is a light-based technique where an image forms on a light projection into the photoresist coated on the substrate (e.g., silicon wafer) [38]. It is widely used technique mainly in the nano-electronics industries to pattern the semiconductors.…”
Section: Lithographymentioning
confidence: 99%