Nd–Fe–B Film Magnets With Thickness Above 100 ${\mu }\text{m}$ Deposited on Si Substrates

PLD-Fabricated Isotropic Pr–Fe–B Film Magnets Deposited on Glass Substrates

“…4. The phenomenon was different from the result of Nd-Fe-B films deposited on Si substrates [25]. We considered that it is attributed to the different structure of a glass (amorphous) and a Si substrate (a single crystalline structure).…”

“…In order to suppress the mechanical deterioration, a Ta buffer layer between a Nd-Fe-B film and a Si substrate has been deposited and MEMS applications comprising the Nd-Fe-B films have been demonstrated using a micromachining technology [23] [24]. On the other hand, the mechanical destruction of PLD-made Nd-Fe-B films on a Si substrate without a buffer layer showed a different phenomenon, namely the samples were broken from the inside of a single crystalline Si substrate (not peeling) [25]. We, therefore, prepared a 20 μm-thick Nd-Fe-B film magnet on a Si substrate with an approximately 1 µm-thick Ta buffer layer.…”

“…We also confirmed that the use of the thick Ta layer was not suitable for a chemical etching process due to the ultimately low etching rate. In order to overcome the difficulty, we increased the Nd content of a PLD-made Nd-Fe-B thick-film by taking account of the linear expansion coefficient for each material and succeeded in enhancing the thickness of the film up to 160 μm on a Si substrate without a buffer layer [25].…”

Application of PLD-Fabricated Thick-Film Permanent Magnets

“…Here, we reported that a control of microstructure of Nd-Fe-B thick films enabled us to increase the thickness above 100 μm without a buffer layer on Si substrates [30]. We investigated the relationship between thickness and Nd contents in annealed isotropic Nd-Fe-B thick films deposited on SiO 2 /Si substrates as seen in Figure 6.…”

Textured Nd-Fe-B hard magnetic thin films prepared by pulsed laser deposition with single alloy targets

“…The first deals with epitaxial growth using multiple targets (Nd, Fe, B, or the combination of one of the two), on single crystalline Al2O3 or MgO substrates [16][17][18]. The second deals with films deposited using a single composite Nd-Fe-B target on tantalum or silicon substrates [19][20][21][22]. In the latter case films were either deposited at elevated temperatures or at room temperature and then annealed to crystallize the hard magnetic Nd2Fe14B phase.…”