The influence of the buffer layer of hafnia dielectric (HfO 2 ) on superconducting properties of niobium nitride films (NbN), produced by the technique of the reactive magnetron depositing has been investigated for the first time. This study presents a comprehensive analysis of morphological, microstructural, and electrophysical parameters of thin NbN films. The dependence of transition critical temperature from the thickness of the HfO 2 buffer layer has been obtained. For the first time, it has been demonstrated that the superconducting properties of niobium nitride films at the HfO 2 buffer layer have high superconductive parameters, namely, Т c ~ 13 K (at the film thickness of approximately 30 nm) and high critical current density of approximately 10 7 A/cm 2 . The relation between the thickness of the HfO 2 buffer layer with the critical current density of niobium nitride films has been determined. It appeared that the values of critical current density increase significantly up to 13 MA/cm 2 when the thickness of the hafnia buffer layer is more than 2 nm.