We present a bistability of low temperature photoluminescence in a n-i-n type-II GaAs/AlAs quantum heterostructure. Spectral analysis and electrical measurements indicate that the two states correspond to hole accumulation in different layers. The transition occurs with the alignment of electronic Γ and Χ states due to optical pumping, and no external voltage bias is needed.PACS numbers: 78.55. Cr, 42.65.Ρc, 72.20.7v The feasibility of type-ΙΙ GaAs/AlAs heterostructures involving X-point conduction states has motivated several studies since 1986 [1][2][3]. In an asymmetric stucture, the creation of internal electric fields due to spatial separation of charges has been demonstrated [4]. We describe here a type-II quantum well stucture which exhibits an intrinsic optical bistability on photoluminescence (PL). The most outstanding point is that, because of photocreated electric fields, it is observable without any external voltage bias, contrary to all other electrooptic bistable devices like self electrooptic effect devices (SEED) [5], double-barrier resonant-tunnelling stuctures [6] or asymmetric quantum wells [7][8][9]. However, electrical detection and switchings are also possible.The stucture grown by molecular beam epitaxy consists of a n-i-n sequence. The intrinsic region is made of four layers, as described and labelled in Fig. 1. It may be viewed as a type-II quantum well, embedded into a Ga0.65Al0.35Αs layer acting as a barrier for Γ-or X-electrons. The electron ground level is of Xxy symmetry [10] and located in the AlAs layer, whereas the hole ground state is of Γ symmetry and located in the GaAs layer. The Γ-symmetry conduction level located in the GaAs layer is about 60 meV. above the Χ ground state. For electrical measurements under optical excitation, we have made 300 x 300 µm mesa-type diodes with a peripheric Au-Ge-Ni ohmic contact by conventional lithography and chemical etching.The PL spectra, obtained with an Argon-laser excitation, show two main lines (Fig. 2): the one (at about 1.80 eV) is attributed to recombination in the type-II well, the other (at about 2.00 eV) to recombination in the GaAlAs barriers. When the n-i-n diode is short-circuited (either by the external contacts in (656)