Nanowire-aware routing considering high cut mask complexity

Su, Yu-Hsuan; Chang, Yao-Wen

doi:10.1145/2744769.2744874

Cited by 11 publications

(2 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Most existing manufacturing-friendly studies focus on the coloring scheme of routing patterns while leveraging SAMP-specific manufacturing constraints [8], [9], [11], [13], [28], [37], [45], c 2017 Information Processing Society of Japan [46], [57], [68]. Reference [45] presents the first SADP-aware detailed routing study by considering SADP-specific constraints during sequential routing procedure.…”

Section: Manufacturing-friendly Unidirectional Routingmentioning

confidence: 99%

“…[11] presents a track assignment approach to handling the cut mask complexities efficiently. Reference [57] proposes global routing studies to reduce cut mask complexities for SAMP-aware routing. Reference [68] introduces local and global pin access planning schemes for better unidirectional routing closure, which generates superior routing results compared to a two-dimensional SADP-friendly router [37].…”

Section: Manufacturing-friendly Unidirectional Routingmentioning

confidence: 99%

See 1 more Smart Citation

Toward Unidirectional Routing Closure in Advanced Technology Nodes

Pan

2017

IPSJ Transactions on System LSI Design Methodology

View full text Add to dashboard Cite

Abstract:In advanced technology nodes, unidirectional layout is strongly preferred for high-density metal layers for better manufacturability. The lithography printing of unidirectional layout can be tightly controlled with illumination source optimization and resolution enhancement techniques. Meanwhile, with the unidirectional layout, self-aligned double and quadruple patterning can be applied to achieve finer pitches beyond the resolutions limits of 193 nm lithography tools. However, unidirectional layout style introduces significant impacts on the physical design flow. Notably, unidirectional routing limits the standard cell pin accessibility, which makes manual cell layout design and optimization more and more challenging under modern standard cell architecture. In the routing phase, routing densities and resource competitions on lower metal layers are becoming increasingly high, where intelligent approaches are needed to resolve routing resource competitions for unidirectional routing closure. Moreover, post-routing optimization is inevitable to avoid significant engineering-changing-efforts for unidirectional routing under advanced manufacturing constraints. In this paper, we present a holistic approach, including standard pin access evaluation/optimization, pin access and routing co-optimization and post-routing optimization, to enable unidirectional routing closure in advanced technology nodes.

show abstract