2008
DOI: 10.1063/1.2924311
|View full text |Cite
|
Sign up to set email alerts
|

Nanoscale three dimensional pattern formation in light emitting porous silicon

Abstract: A simple and efficient method for generating light emitting three-dimensional ͑3D͒ nanoscale pattern in silicon is presented. The method is based on differential chemical etching on and in-between patterned metal features. Effective transfer of various two-dimensional nanoscale ͑10-100 nm͒ metal patterns on bulk silicon to 3D porous silicon network is demonstrated. The capability and limitations of this method are discussed.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
34
0

Year Published

2010
2010
2020
2020

Publication Types

Select...
6
1
1

Relationship

1
7

Authors

Journals

citations
Cited by 33 publications
(35 citation statements)
references
References 16 publications
(26 reference statements)
1
34
0
Order By: Relevance
“…MacEtch of silicon refers to the wet etching of silicon in the presence of noble metal particles or films, which are physically or chemically deposited onto the silicon surface to enhance silicon etching at open‐circuit potential (OCP) in oxidizing hydrofluoric acid (HF) aqueous solutions. [ 35–157 ] Within the last couple of years, MacEtch of silicon in HF aqueous solutions has aroused great interest in the research community and is presently one of the most popular top‐down approached for micro/nanofabrication owing to its cost‐effectiveness, simplicity, versatility, and scalability. [ …”
Section: Origin Mechanism and Development Of Metal‐assisted Chemicamentioning
confidence: 99%
“…MacEtch of silicon refers to the wet etching of silicon in the presence of noble metal particles or films, which are physically or chemically deposited onto the silicon surface to enhance silicon etching at open‐circuit potential (OCP) in oxidizing hydrofluoric acid (HF) aqueous solutions. [ 35–157 ] Within the last couple of years, MacEtch of silicon in HF aqueous solutions has aroused great interest in the research community and is presently one of the most popular top‐down approached for micro/nanofabrication owing to its cost‐effectiveness, simplicity, versatility, and scalability. [ …”
Section: Origin Mechanism and Development Of Metal‐assisted Chemicamentioning
confidence: 99%
“…This concept provides a strategy for local formation of PSi by means of selectively depositing catalyst metal to silicon surface and then performed chemical etching. 114,121,122 Li et al 114 prepared PSi protein microarrays by combining metal-assisted chemical etching and photolithography process. They compared this method with automatic spotting on a homogenous PSi surface, which is a commonly used method to produce protein microarrays, and found the former presented a homogenous microarray image with a clean background, while the spotted surface was disordered and had more non-specic adsorption on the background.…”
Section: With Permission Frommentioning
confidence: 99%
“…The rolled-up microtubes can be made porous by depositing Au on the rolled-up tubes and immersing them in a metal-assisted chemical etching (MacEtch) solution [25,[31][32][33][34]. Shown in Fig.…”
Section: Rolling-up Patterned Strained Membranes To Form Holey or Nanmentioning
confidence: 99%