2014
DOI: 10.1063/1.4864616
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Nanoscale patterning of graphene through femtosecond laser ablation

Abstract: Articles you may be interested inPlasmonic formation mechanism of periodic 100-nm-structures upon femtosecond laser irradiation of silicon in waterThe role of asymmetric excitation in self-organized nanostructure formation upon femtosecond laser ablation AIP Conf.

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Cited by 114 publications
(81 citation statements)
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“…Previously it has been shown that femtosecond (Kalita et al 2011, Sahin et al 2014 and nanosecond (Kiisk et al 2013) pulsed lasers can ablate graphene. In this paper we expand on this previous work towards actual device fabrication and electrical characterization, and compare different wavelengths (355 nm, 532 nm and 1064 nm) of picosecond lasers to determine the optimal compromise between full laser ablation of graphene and avoidance of damage to the underlying SiO 2 substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Previously it has been shown that femtosecond (Kalita et al 2011, Sahin et al 2014 and nanosecond (Kiisk et al 2013) pulsed lasers can ablate graphene. In this paper we expand on this previous work towards actual device fabrication and electrical characterization, and compare different wavelengths (355 nm, 532 nm and 1064 nm) of picosecond lasers to determine the optimal compromise between full laser ablation of graphene and avoidance of damage to the underlying SiO 2 substrate.…”
Section: Introductionmentioning
confidence: 99%
“…To the best of our knowledge, we present here for the first time a low-cost dry method to fabricate coplanar interdigitated electrodes based on single-layer graphene. The presented dry fabrication method introduces features such as reliability, amenability, upward scalability, and low cost, which are attractive advantages with respect to other techniques conventionally used to define patterns on graphene, that present drawbacks comprising graphene under-etching and contamination from the contacting mask (mask lithography), [37] undesirable presence of residual polymers that contaminate the graphene surface (photolithography), [38] low fabrication yield and harmful effects on atomically thick graphene layers (laser cutting), [39,40] and complex and costly techniques, incompatible with plastic substrates (laser scribing and helium ion microscopy). [38,39] …”
Section: Fabrication Of Graphene-based Transparent Touch-sensitive Layermentioning
confidence: 99%
“…There is an intensive effort on the use of lasers of different energies, from the infrared to the ultraviolet, and different time scales, from continuous to femto-second lasers [19] to pattern graphene and graphene oxide materials [20,21,22]. Lasers are being used either to induce the partial reduction of graphene oxide films providing paths of increased conductivity and particularly well suited for applications in batteries and supercapacitors [2,3], or to eliminate graphene [23,24]. Recently, a soft lithography-based approach has been used over square millimeter areas [25].…”
mentioning
confidence: 99%