2015
DOI: 10.1016/j.carbon.2015.04.018
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Large area graphene and graphene oxide patterning and nanographene fabrication by one-step lithography

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Cited by 15 publications
(9 citation statements)
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“…The white dashed circle at the center of the large spot represents an estimation of the tip size. Craters generated at low RH < 40% usually exhibit a brighter contrast due to the removal of graphene (as confirmed by the disappearance of the Raman signal), and appear to progress not radially but through lobes or fingers, indicating that are driven by a different mechanism . For more information about results of craters by graphene removal, see the Supporting Information.…”
Section: Resultsmentioning
confidence: 85%
“…The white dashed circle at the center of the large spot represents an estimation of the tip size. Craters generated at low RH < 40% usually exhibit a brighter contrast due to the removal of graphene (as confirmed by the disappearance of the Raman signal), and appear to progress not radially but through lobes or fingers, indicating that are driven by a different mechanism . For more information about results of craters by graphene removal, see the Supporting Information.…”
Section: Resultsmentioning
confidence: 85%
“…On the surface of the passivation layer, we patterned graphene films into pixelated electrodes. Various graphene patterning methods have been proposed [18,[24][25][26]. However, the majority of these methods yield deterioration of graphene surface quality and incorrect geometric dimensions.…”
Section: Resultsmentioning
confidence: 99%
“…In order to make the hybrid conductor of Ag NW-GP with high optical and electrical properties, there has been big progress in GP mesh engineering by tailoring its pattern into predefined shapes, position, and sizes at atomic scale mainly through (i) vacuum processes of He-ion/electron beam lithography, O 2 plasma etching, nanoimprint lithography, catalytic passivation, catalytic etching and hot embossing imprinting [13][14][15][16][17][18][19][20], and (ii) non-vacuum approaches of laser-assisted transfer printing, laser ablation, micro-molding, and masking layer based mesh-patterning [21][22][23][24][25][26][27].…”
Section: Introductionmentioning
confidence: 99%
“…First, most GP patterning approaches require complicated, low durability and expensive lithographic steps, instruments, and materials, leading to lacked scalability and low production speed of GP meshes [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29]. Specifically, the as-mentioned patterning process for GP involves multiple steps of complicated template/mask preparation (mask lithography), lifting/stamping of patterned GP onto a substrate, photoresist (PR) developing, etching, PR/mask removal, and laser ablation [13][14][15][16][17][18][19][20][21][22][23][24][25][26][27]. Second, the optical interference effect (i.e., Moire phenomenon) can be observed in the display image because of a constructive and destructive interferences by regularly arrayed voids in GP mesh [34,35].…”
Section: Introductionmentioning
confidence: 99%