2000
DOI: 10.1063/1.126701
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Nanoscale InGaAs concave disks fabricated by heterogeneous droplet epitaxy

Abstract: The detailed cross-sectional structure of InGaAs quantum dots fabricated by a heterogeneous droplet epitaxy method was investigated by means of cross-sectional transmission electron microscopy observation. It was confirmed that concave disks without any dislocations or wetting layer were formed at the upper part of the flat surface. This result was consistent with the change of photoluminescence intensity and peak position. The sizes of the disks were estimated to be 30 and 12 nm in lateral and vertical direct… Show more

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Cited by 66 publications
(37 citation statements)
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“…The QD2 PL peaks at 1.285 eV and the HWHM is 11 meV at T =10 K. More details on the HDE-QD growth may be found in Ref. 19. The experimental data are reported in Figs.…”
Section: Resultsmentioning
confidence: 78%
See 1 more Smart Citation
“…The QD2 PL peaks at 1.285 eV and the HWHM is 11 meV at T =10 K. More details on the HDE-QD growth may be found in Ref. 19. The experimental data are reported in Figs.…”
Section: Resultsmentioning
confidence: 78%
“…QD2 is an InGaAs/ GaAs QD structure grown without a WL by taking advantage of a modified MBE method, the heterogeneous droplet epitaxy ͑HDE͒. 18,19 The HDE growth method permits the assembling of nanometer size InGaAs inclusions in a GaAs matrix. The typical dimensions of the HDE-QDs are 30 nm base width and 12 nm height and the average In content of the QD is around 20%.…”
Section: Resultsmentioning
confidence: 99%
“…The droplet epitaxy (DE) method has the merit of the growth of various quantum structures, such as quantum rings, disks, coupled QDs, and concentric quantum double rings, as well as low-density QDs, due to a perfect separation of groups 3 and 5 [12][13][14][15]. In addition, larger GaAs DE QDs can be grown on AlGaAs without strain effect, for larger oscillation strength, compared with InAs QDs on GaAs.…”
Section: Introductionmentioning
confidence: 99%
“…Although the StranskiKrastanow (S-K) growth mode is often used for such self-assembly [4,5], it can only be applied to lattice-mismatched systems like In(Ga)As/GaAs for which the lattice constant of the three-dimensional nanostructure (In(Ga)As) is different from that of the substrate (GaAs). On the other hand, the droplet epitaxy is applicable not only to the lattice-mismatched systems [6,7] but also to lattice-matched systems like GaAs/AlGaAs [8]. The lattice-matched systems are strain free in principle, and hence, have simpler and more isotropic electronic structures than the lattice-mismatched systems.…”
Section: Introductionmentioning
confidence: 99%