Abstract:The effect of single nondestructive pulsed voltage prestresses on the time to breakdown distributions of a SiON/ HfSiON bilayer gate stack is investigated at nanometric scale using an atomic force microscope in conduction mode under ultrahigh vacuum. The results are compared with the degradation due to a voltage pulse of the SiON layer alone. It is found that only the shape parameters of the distributions are affected by the prestress pulses. This effect is then discussed in terms of a progressive degradation … Show more
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