Abstract:Nanoimprinting lithography (NIL) technique is widely utilized for nanostructure engineering of soft materials. Owing to the soft organic/inorganic hybrid nature, the optical and crystallographic properties of halide perovskites (HPs) are improved by the NIL process. However, the wide application of NIL into various HPs has lagged. Herein, a defect‐free nanopatterned‐(FAPbI3)0.85(MAPbBr3)0.15 (NP‐FAMA) film is successfully developed via optimized NIL. As surface energy is a key parameter to be controlled for ac… Show more
“…Chun et al employed NIL on mixed HPs to enhance the photocurrent generation of flexible photodetectors. [82] Their study demonstrated that nanopatterning allows precise control over device structures and morphologies, leading to higher photoconversion efficiency. An et al utilized nanoimprinting to fabricate highly aligned CsCu 2 I 3 nanowires to develop highly responsive, polarization-sensitive, flexible, and stable photodetectors.…”
Section: Nanoimprint Lithography For Crystalline Materialsmentioning
The assembly of functional materials into microstructures, which extends unique features such as enlarged specific surface areas, effective conduction paths, higher material utilization ratios, and ordered alignment compared to continuous films, has gained prominence in various fields. Achieving high performance in electronics requires cooperation among building blocks, fabrication methods, and device design. However, the remaining challenge is obtaining highly regular and large‐scale patterns with controllable assembly methods while maximizing device performances. Manipulating functional materials with liquid assistance is a feasible approach to realizing controllable dewetting, regular molecule packing, and customized performances. This review focuses on the recent advances in preparing and applying liquid‐induced microstructures. The predominant preparation technologies are summarized, including flow‐enabled assembly, nanoimprint lithography, and capillary‐bridge‐mediated assembly. Furthermore, diverse applications of various microstructure‐based electronics, such as flexible and transparent electrodes, organic field‐effect transistors, gas sensors, photodetectors, and solar cells, are demonstrated.
“…Chun et al employed NIL on mixed HPs to enhance the photocurrent generation of flexible photodetectors. [82] Their study demonstrated that nanopatterning allows precise control over device structures and morphologies, leading to higher photoconversion efficiency. An et al utilized nanoimprinting to fabricate highly aligned CsCu 2 I 3 nanowires to develop highly responsive, polarization-sensitive, flexible, and stable photodetectors.…”
Section: Nanoimprint Lithography For Crystalline Materialsmentioning
The assembly of functional materials into microstructures, which extends unique features such as enlarged specific surface areas, effective conduction paths, higher material utilization ratios, and ordered alignment compared to continuous films, has gained prominence in various fields. Achieving high performance in electronics requires cooperation among building blocks, fabrication methods, and device design. However, the remaining challenge is obtaining highly regular and large‐scale patterns with controllable assembly methods while maximizing device performances. Manipulating functional materials with liquid assistance is a feasible approach to realizing controllable dewetting, regular molecule packing, and customized performances. This review focuses on the recent advances in preparing and applying liquid‐induced microstructures. The predominant preparation technologies are summarized, including flow‐enabled assembly, nanoimprint lithography, and capillary‐bridge‐mediated assembly. Furthermore, diverse applications of various microstructure‐based electronics, such as flexible and transparent electrodes, organic field‐effect transistors, gas sensors, photodetectors, and solar cells, are demonstrated.
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