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2021
DOI: 10.1088/1361-6528/ac385e
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Nanopatterning of oxide 2-dimensional electron systems using low-temperature ion milling

Abstract: We present a ‘top-down’ patterning technique based on ion milling performed at low-temperature, for the realization of oxide two-dimensional electron system devices with dimensions down to 160 nm. Using electrical transport and scanning Superconducting QUantum Interference Device measurements we demonstrate that the low-temperature ion milling process does not damage the 2DES properties nor creates oxygen vacancies-related conducting paths in the STO substrate. As opposed to other procedures used to realize ox… Show more

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Cited by 4 publications
(4 citation statements)
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References 46 publications
(51 reference statements)
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“…[ 27 ] Another approach consists in reducing the kinetics of the oxygen vacancy formation and diffusion out of the sample by cooling it with liquid nitrogen during the ion beam etching. [ 28 ] The sides of the devices thus fabricated are free, and could couple in‐plane to subsequently grown complex materials such as conventional superconductors. Using this technique, a pattern resolution of 160 nm could be reached.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 27 ] Another approach consists in reducing the kinetics of the oxygen vacancy formation and diffusion out of the sample by cooling it with liquid nitrogen during the ion beam etching. [ 28 ] The sides of the devices thus fabricated are free, and could couple in‐plane to subsequently grown complex materials such as conventional superconductors. Using this technique, a pattern resolution of 160 nm could be reached.…”
Section: Resultsmentioning
confidence: 99%
“…Using this technique, a pattern resolution of 160 nm could be reached. [28] Here, a thin film of Al was sputtered on a (111)-oriented KTaO 3 , then oxidized to AlO x in air, and subsequently capped by a 10 nm thick protective layer of amorphous LaAlO 3 grown by pulsed laser deposition in O 2 atmosphere at 1 × 10 −6 mbar. We then patterned the sample by UV lithography to form 25 μm wide Hall bars.…”
Section: Resultsmentioning
confidence: 99%
“… 11 , revealing high structural and chemical order. Some of the samples investigated were patterned to realize a Hall bars 500 μm wide, using photolithography and low-temperature ion milling 27 .…”
Section: Methodsmentioning
confidence: 99%
“…In addition, specific works on the basic SPM mechanisms are the contrast due to Van der Waals interactions [135] and metrological measurements [136,137]. Differently from the recent past [138], nanofabrication with SPM has been replaced by ion milling [139,140], whereas nanomanipulation has been abandoned, except for a recent example [141].…”
Section: Scientific Research Publications and Fundings Of Italian Spm...mentioning
confidence: 99%