Nanopatterning of organic and inorganic materials by holographic lithography and plasma etching

Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithography

“…53,56,57 In practice, it is much more convenient to arrange two beams with different geometries to access a wide range of lattices with variable unit sizes and large contrast. For example, both square and tetragonal 2D lattices can be obtained by simply rotating the sample stage with precise control over the in-plane rotation of the substrate.…”

Relevant Reducing Agents in Remediation Fe0/H2O Systems

“…Cold plasmas have been used as a step in nanotopographies / nanopatterns manufacturing,15, 43–46 especially in reactive ion etching of predeposited or self‐assembled patterned masks into a surface 1–2, 27–30, 47–48. Recent reports investigate the direct use of plasma for nanopatterning of silicone‐based and nanocomposite materials,49 for producing self‐assembled layers of special polymers on surfaces,47 and for directly producing micro‐ and nano‐topography on PP, PET, PMMA, PTFE surfaces 50–56.…”

Creating Three‐Dimensional Polymeric Microstructures by Multi‐Beam Interference Lithography

“…(63,66,67) In practice, it is much more convenient to arrange two beams with different geometries to access a wide range of lattices with variable unit sizes and large contrast. For example, both square and tetragonal 2D lattices can be attained by simply rotating the sample stage with a precise control of the in-plane rotation of the substrate.…”