Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithography

Abstract

The fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defectfree over a large area. This review discusses the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative-tone and positive-tone photoresists, organic-inorganic hybrids, hydrogels, and holographic polymer-dispersed liquid crystals. AbstractThe fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defect-free over a large area. This review discusses the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative-tone and positive-tone photoresists, organic-inorganic hybrids, hydrogels, and holographic polymer-dispersed liquid crystals.

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

“…However, if the strong emission of mercury lamps or the sun in the visible region of the spectrum is to be used, photoinitiating systems that absorb visible light are required. Photoinitiators for visible light [77][78][79] have found particular interest because of their use in many targeted applications such as dental filling materials, [80][81][82] photoresists, 83 printing plates, 84 integrated circuits, 78 laser-induced 3D curing, 85,86 holographic recordings, 85,86 and nanoscale micromechanics. 77 Both cleavable and bimolecular hydrogen abstracting type photoinitiating systems, acting in the visible range, are well-known.…”

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

“…However, MBI has found numerous additional applications outside the microelectronics industry, specifically in the fields of photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures. Several review papers are available that describe MBI methods and capabilities [3,6,7] while a recent review focuses on the impact of interference lithography on nanostructure research [8]. The present work complements these papers, providing a review of the advances in MBI and MBIL and their use in nano-electronics, followed by a unified, comprehensive discussion of other current applications.…”

Effect of Nano-Texturing on Adhesion of Thermoplastic Resin against Textured Steel Plate

“…The nano-texture shaped photoresist was constructed by three-beam interference lithography method with 355 nm continuous wave laser [35,37]. Geometrical pattern of the photoresist was controlled by changing real amplitude, polarization and phase of three beams [38]. Table 2 …”

“…Nowadays, some laser treatment methods which use multi-beam interfereance or femto-second laser are able to produce nano-texturing on material surface [30][31][32][33][34][35][36][37][38]. Nano-order texturing controls contact area between resin and metal surface by changing geometrical parameters.…”