Nanometer-Scale Arrangement of Human Serum Albumin by Adsorption on Defect Arrays Created with a Finely Focused Ion Beam

Abstract

Well-ordered arrays of pits were prepared on gallium arsenide and silicon wafers using a finely focused ion beam (FFIB). The defect pits on gallium arsenide, examined with tapping mode scanning force microscopy (TM-SFM), had a rim diameter of 60 nm and were spaced 185 nm apart. TM-SFM images showed that human serum albumin (HSA) adsorption was highly specific to the inner portion of the rims of the pits on gallium arsenide, while there was no specific adsorption to the rims of pits on silica. This study demonstrates that a controlled spatial distribution of adsorbed proteins can be achieved on a nanometer scale and that the choice of material is of importance. Moreover, surface features such as pits and lines produced by FFIB can serve as a guide to easily reposition the TM-SFM probe tip at a specific location on the surface to within a few nanometers after temporary removal of the sample from the microscope.

The Stability of Lysozyme Adsorbed on Silica and Gallium Arsenide Surfaces: Preferential Destabilization of Part of the Lysozyme Structure by Gallium Arsenide

“…Lysozyme is chosen because both the H/D exchange behavior with respect to its structure (17) and its folding dynamics (9,10) and the adsorption behavior on various surfaces, including silica (18)(19)(20)(21), have been extensively investigated. GaAs surfaces have a high potential for use in creating site-selective adsorption of proteins on a nanoscale (22).…”

Site‐Specific Patterning of Biomolecules and Quantum Dots on Functionalized Surfaces Generated by Plasma‐Enhanced Chemical Vapor Deposition

“…Spatial binding of biomolecules and quantum dots to PECVD-patterned substrates is demonstrated. Currently, surface patterning of biomolecules involves techniques such as dip-pen nanolithography, [10][11][12] electron- [13] and ion-beam lithography, [14,15] polydimethylsiloxane stamping, [8,16] ink-jet printing, [17] nanoparticle self-assembly, [18] chemical selectivity on patterned gold, [19] and atomic force microscopy (AFM) mediated nanografting. [20,21] These techniques encounter inherent limitations and drawbacks for biomolecular patterning.…”

Preparation of gas sensors via dip-pen nanolithography

“…Photolithography is typically utilized in semiconductor manufacturing applications due to their high throughput; however, photolithography is limited in resolution (about 110 nm) by the wavelength of light [1]. Direct write electron and ion beam lithographies have demonstrated the best resolution of the conventional patterning strategies, achieving well spaced 8-10-nm wide lines; however, this methodology is fiscally expensive, and the achievable resolution is greatly affected by the proximity of the features to one another and by the substrate material [2,3] CP and NIL have little control over the amount of material deposited [4,5], and the stamp fabrication (which decides the resolution) is challenging. Scanning probe microscopy (SPM), such as scanning tunneling microscopy (STM) [6] and atomic force microscopy (AFM) [7] can visualize surfaces with atomic resolution [8,9].…”